Tokyo
Japan
20
2023-10-26
The entities that hold a legal rights for patent applications filed by inventor ANNO Yusuke:
Yusuke ANNO from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
#2 | 2023-03-02COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE
#3 | 2023-02-16RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE
#4 | 2022-05-12COMPOSITION, SILICON-CONTAINING FILM, METHOD OF FORMING SILICON-CONTAINING FILM, AND METHOD OF TREATING SEMICONDUCTOR SUBSTRATE
#5 | 2019-05-23PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT
#6 | 2019-01-24FILM-FORMING MATERIAL FOR RESIST PROCESS AND PATTERN-FORMING METHOD
#7 | 2017-11-09Resist pattern-forming method
#8 | 2016-11-03RESIST PATTERN-FORMING METHOD
#9 | 2016-10-06Pattern-forming method and composition for resist pattern-refinement
#10 | 2016-04-07RESIST PATTERN-FORMING METHOD
#11 | 2015-06-11RESIST PATTERN-FORMING METHOD
#12 | 2015-02-19Resist pattern-forming method
#13 | 2014-12-18Pattern-forming method, and composition for forming resist underlayer film
#14 | 2014-05-15Resist pattern-forming method
#15 | 2013-05-23Polysiloxane composition and pattern-forming method
#16 | 2013-01-24RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND
#17 | 2012-11-15Pattern-forming method, and composition for forming resist underlayer film
#18 | 2012-07-19Resist pattern-forming method
#19 | 2011-09-15RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME
#20 | 2011-05-05Positive-type radiation-sensitive composition, and resist pattern formation method
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