🔗 Permalink

Inventor profile of:

Noboru Otsuka

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2025-08-28

Top Assignees for applications by Noboru Otsuka

The entities that hold a legal rights for patent applications filed by inventor Otsuka Noboru:

JSR Corporation 12 Tokyo, Japan

Recent patent applications by Otsuka Noboru

Noboru Otsuka from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-08-28

US20250271762A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

#2 | 2025-08-28

US20250271761A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

#3 | 2025-08-28

US20250271756A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID-GENERATING AGENT

#4 | 2025-03-13

US20250085629A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

#5 | 2025-03-06

US20250076762A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

#6 | 2025-03-06

US20250076761A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

#7 | 2025-03-06

US20250076760A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

#8 | 2013-01-24

US20130022926A1

Physics

Radiation-sensitive resin composition

#9 | 2012-03-15

US20120065291A1

Physics

Radiation-sensitive resin composition, polymer, and compound

#10 | 2011-06-16

US20110143279A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION

#11 | 2010-08-12

US20100203447A1

Chemistry; metallurgy

Radiation-sensitive resin composition

#12 | 2010-03-18

US20100068647A1

Physics

Radiation-sensitive resin composition

InventorID:

53276 ⎘