Etay Lavert

City:

Milpitas, California

Country:

United States

Published Applications:

Last publication date:

2024-01-18

Top Assignees for applications by Etay Lavert

The entities that hold a legal rights for patent applications filed by inventor Lavert Etay:

Etay Lavert from Milpitas, US has applied for patents for these inventions. The list has both pending applications and granted patents:

System and method for determining target feature focus in image-based overlay metrology

EXTRA TALL TARGET METROLOGY

Optical metrology utilizing short-wave infrared wavelengths

System and method for determining target feature focus in image-based overlay metrology

InventorID:

5372564 ⎘