Sunnyvale, California
United States
15
2020-07-16
The entities that hold a legal rights for patent applications filed by inventor Kojiri Hidehiro:
Hidehiro Kojiri from Sunnyvale, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method of forming film stacks with reduced defects
#2 | 2017-07-20RPS defect reduction by cyclic clean induced RPS cooling
#3 | 2013-12-05Method of forming a group III-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (HVPE)
#4 | 2012-11-22Methods for pretreatment of group III-nitride depositions
#5 | 2012-11-22Methods for improved growth of group III nitride buffer layers
#6 | 2012-11-22Methods for improved growth of group III nitride semiconductor compounds
#7 | 2012-09-20LIGHT EMITTING DIODE WITH ENHANCED QUANTUM EFFICIENCY AND METHOD OF FABRICATION
#8 | 2012-06-21SUBSTRATE PRETREATMENT FOR SUBSEQUENT HIGH TEMPERATURE GROUP III DEPOSITIONS
#9 | 2011-10-27GROUP III-NITRIDE N-TYPE DOPING
#10 | 2011-06-16NANO-SPHERICAL GROUP III-NITRIDE MATERIALS
#11 | 2011-01-20Method of forming a group III-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (HVPE)
#12 | 2010-11-04METHOD OF FORMING IN-SITU PRE-GaN DEPOSITION LAYER IN HVPE
#13 | 2010-10-28Substrate pretreatment for subsequent high temperature group III depositions
#14 | 2010-02-04CHAMBER PLASMA-CLEANING PROCESS SCHEME
#15 | 2009-05-07IN-SITU CHAMBER CLEANING METHOD
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