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Inventor profile of:

Minki CHON

City:

Suwon-si

Country:

South Korea

Published Applications:

Last publication date:

2026-01-01

Top Assignees for applications by Minki CHON

The entities that hold a legal rights for patent applications filed by inventor CHON Minki:

Samsung SDI Co., Ltd. 3 Yongin-si, South Korea
SAMSUNG ELECTRONICS CO., LTD. 2 Suwon-si, South Korea
Samsung Electronics Co., Ltd. 1 Yongin-si, South Korea

Recent patent applications by CHON Minki

Minki CHON from Suwon-si, KR has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-01-01

US20260003265A1

Physics

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

#2 | 2025-10-02

US20250306457A1

Physics

SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITION

#3 | 2025-10-02

US20250306456A1

Physics

SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITION

#4 | 2025-03-27

US20250102907A1

Physics

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

#5 | 2023-09-14

US20230288809A1

Physics

COMPOSITION FOR RESIST UNDERLAYER AND PATTERN FORMATION METHOD USING SAME

#6 | 2023-02-02

US20230032354A1

Physics

METHOD FOR FORMING PHOTORESIST PATTERNS

#7 | 2023-01-26

US20230028244A1

Physics

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

#8 | 2023-01-26

US20230026721A1

Physics

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

#9 | 2023-01-26

US20230026579A1

Physics

METHOD FOR FORMING PHOTORESIST PATTERNS

#10 | 2023-01-26

US20230024422A1

Chemistry; metallurgy

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

#11 | 2023-01-26

US20230021469A1

Chemistry; metallurgy

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

InventorID:

5637210 ⎘