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Inventor profile of:

Kensuke MIYAO

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2026-03-19

Top Assignees for applications by Kensuke MIYAO

The entities that hold a legal rights for patent applications filed by inventor MIYAO Kensuke:

JSR Corporation 11 Tokyo, Japan

Recent patent applications by MIYAO Kensuke

Kensuke MIYAO from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-03-19

US20260079396A1

Physics

RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND

#2 | 2026-03-05

US20260063994A1

Physics

RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND

#3 | 2025-08-28

US20250271762A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

#4 | 2025-08-28

US20250271761A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

#5 | 2025-08-28

US20250271756A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID-GENERATING AGENT

#6 | 2025-05-22

US20250164877A1

Physics

RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR

#7 | 2025-03-13

US20250085629A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

#8 | 2025-03-06

US20250076762A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

#9 | 2025-03-06

US20250076761A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

#10 | 2025-03-06

US20250076760A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

#11 | 2023-04-06

US20230106095A1

Physics

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

InventorID:

5705206 ⎘