Tokyo
Japan
40
2026-06-18
The entities that hold a legal rights for patent applications filed by inventor WATANABE KATSUHIDE:
KATSUHIDE WATANABE from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
SUBSTRATE PROCESSING APPARATUS
#2 | 2025-10-30POLISHING APPARATUS
#3 | 2025-04-10SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD
#4 | 2024-09-26SUBSTRATE PROCESSING CONTROL SYSTEM, SUBSTRATE PROCESSING CONTROL METHOD, AND PROGRAM
#5 | 2024-09-19SUBSTRATE PROCESSING APPARATUS AND INFORMATION PROCESSING SYSTEM
#6 | 2024-03-14SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD
#7 | 2022-11-24Substrate processing apparatus, substrate processing system, and substrate processing method
#8 | 2022-08-25SUBSTRATE PROCESSING APPARATUS
#9 | 2022-08-25CONTROL METHOD FOR PROCESSING OF A SUBSTRATE
#10 | 2022-03-03Output signal processing apparatus for eddy current sensor
#11 | 2021-10-07Polishing head system and polishing apparatus
#12 | 2021-08-05Polishing head system and polishing apparatus
#13 | 2021-06-03SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD
#14 | 2021-04-08Substrate polishing apparatus, method of creating thickness map, and method of polishing a substrate
#15 | 2021-01-07Eddy current sensor
#16 | 2020-07-30Substrate processing apparatus, substrate processing system, and substrate processing method
#17 | 2020-07-16SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR SPECIFYING AREA TO BE PARTIALLY POLISHED BY SUBSTRATE PROCESSING APPARATUS
#18 | 2020-06-04Polishing machine and a polishing method for a substrate
#19 | 2019-08-08Substrate processing control system, substrate processing control method, and program
#20 | 2019-06-27Magnetic element and eddy current sensor using the same
#21 | 2018-10-04SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME
#22 | 2018-03-01Substrate processing apparatus and substrate processing method
#23 | 2017-09-14POLISHING MACHINE AND A POLISHING METHOD FOR A SUBSTRATE
#24 | 2017-09-07POLISHING APPARATUS
#25 | 2017-05-25Polishing method
#26 | 2017-02-16Substrate processing apparatus, substrate processing system, and substrate processing method
#27 | 2015-04-23A METHOD OF POLISHING A SUBSTRATE HAVING A FILM ON A SURFACE OF THE SUBSTRATE FOR SEMICONDUCTOR MANUFACTURING
#28 | 2015-04-02Polishing apparatus having substrate holding apparatus
#29 | 2015-04-02Polishing apparatus having thermal energy measuring means
#30 | 2015-01-15Polishing apparatus and polished-state monitoring method
#31 | 2015-01-15FILM-THICKNESS MEASURING APPARATUS, FILM-THICKNESS MEASURING METHOD, AND POLISHING APPARATUS HAVING THE FILM-THICKNESS MEASURING APPARATUS
#32 | 2014-11-20Method of obtaining a sliding distance distribution of a dresser on a polishing member, method of obtaining a sliding vector distribution of a dresser on a polishing member, and polishing apparatus
#33 | 2014-09-25Method of adjusting profile of a polishing member used in a polishing apparatus, and polishing apparatus
#34 | 2014-01-16Method of polishing a substrate having a film on a surface of the substrate for semiconductor manufacturing
#35 | 2013-12-19POLISHING METHOD
#36 | 2013-05-30Elastic membrane
#37 | 2012-03-15Polishing apparatus
#38 | 2012-03-08Polishing apparatus having thermal energy measuring means
#39 | 2010-07-29Apparatus for dressing a polishing pad, chemical mechanical polishing apparatus and method
#40 | 2007-05-17Substrate treatment apparatus and substrate treatment method
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