Nirasaki
Japan
30
2021-12-09
The entities that hold a legal rights for patent applications filed by inventor Okada Mitsuhiro:
Mitsuhiro Okada from Nirasaki, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Method of manufacturing semiconductor device
#2 | 2021-03-25Silicon film forming method and substrate processing apparatus
#3 | 2020-08-13Substrate processing method and substrate processing apparatus
#4 | 2019-05-16Cleaning method and film forming method
#5 | 2018-06-28Film forming apparatus, film forming method and heat insulating member
#6 | 2017-12-14Method of manufacturing semiconductor device, heat treatment apparatus, and storage medium
#7 | 2017-10-05Method and apparatus for forming boron-doped silicon germanium film, and storage medium
#8 | 2017-10-05Method and apparatus for forming silicon film and storage medium
#9 | 2017-08-24Film forming method
#10 | 2016-06-30Method of forming silicon film
#11 | 2016-02-18Method of forming germanium film and apparatus therefor
#12 | 2015-06-11Amorphous silicon crystallizing method, crystallized silicon film forming method, semiconductor device manufacturing method and film forming apparatus
#13 | 2015-04-16Apparatus for forming silicon-containing thin film
#14 | 2015-02-05Method and apparatus for forming silicon film
#15 | 2015-02-05Silicon film forming method, thin film forming method and cross-sectional shape control method
#16 | 2014-09-25Batch-type vertical substrate processing apparatus and substrate holder
#17 | 2013-12-05Method and apparatus for forming silicon film
#18 | 2013-10-31Impurity diffusion method, substrate processing apparatus, and method of manufacturing semiconductor device
#19 | 2013-09-19Method of forming a laminated semiconductor film
#20 | 2013-05-02Method of forming seed layer and method of forming silicon-containing thin film
#21 | 2012-09-20Processing method for forming structure including amorphous carbon film
#22 | 2012-06-28Trench embedding method
#23 | 2011-08-11Method for forming laminated structure including amorphous carbon film
#24 | 2010-12-09Batch processing method for forming structure including amorphous carbon film
#25 | 2010-08-19Method for using apparatus configured to form germanium-containing film
#26 | 2009-09-17Film formation apparatus for semiconductor process and method for using same
#27 | 2009-05-14Method for forming poly-silicon film
#28 | 2009-01-29Film formation method and apparatus for semiconductor process
#29 | 2008-11-20Film formation apparatus and method for using the same
#30 | 2008-06-05Film formation apparatus and method for using the same
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