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Inventor profile of:

Daisuke Toriya

City:

Nirasaki

Country:

Japan

Published Applications:

Last publication date:

2021-09-30

Top Assignees for applications by Daisuke Toriya

The entities that hold a legal rights for patent applications filed by inventor Toriya Daisuke:

TOKYO ELECTRON LIMITED 11 Tokyo, Japan
TOKYO ELECTRON LIMITED 1 Minato-ku, Japan

Recent patent applications by Toriya Daisuke

Daisuke Toriya from Nirasaki, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2021-09-30

US20210302846A1

Physics

Substrate stage and substrate processing apparatus

#2 | 2020-08-06

US20200248306A1

Chemistry; metallurgy

Method of controlling substrate processing apparatus, and substrate processing apparatus

#3 | 2020-05-28

US20200165723A1

Chemistry; metallurgy

Substrate holder and film forming apparatus

#4 | 2020-03-26

US20200095680A1

Chemistry; metallurgy

Placement apparatus and processing apparatus

#5 | 2020-01-09

US20200010956A1

Chemistry; metallurgy

Film-forming apparatus

#6 | 2018-06-21

US20180171478A1

Chemistry; metallurgy

Gas treatment apparatus and gas treatment method

#7 | 2016-12-08

US20160355928A1

Chemistry; metallurgy

Film forming apparatus

#8 | 2016-03-24

US20160083837A1

Chemistry; metallurgy

Film formation device

#9 | 2014-05-15

US20140130743A1

Electricity

Film forming apparatus

#10 | 2009-11-12

US20090277895A1

Electricity

Mounting table structure, and processing apparatus

#11 | 2005-06-02

US20050115501A1

Physics

Processing device and method of maintaining the device

InventorID:

6031759 ⎘