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Inventor profile of:

Yukio Nishimura

City:

Mie

Country:

Japan

Published Applications:

6

Last publication date:

2009-05-12

Top Assignees for applications by Yukio Nishimura

The entities that hold a legal rights for patent applications filed by inventor Nishimura Yukio:

JSR Corporation 6 Tokyo, Japan
INTERNATIONAL BUSINESS MACHINES CORPORATION 2 ARMONK, NY United States

Recent patent applications by Nishimura Yukio

Yukio Nishimura from Mie, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2009-05-12

US10386707

Radiation-sensitive resin composition

#2 | 2006-08-08

US10261249

193nm resist with improved post-exposure properties

#3 | 2005-11-15

US10867892

Radiation-sensitive resin composition

#4 | 2005-09-29

US20050214680A1

Radiation-sensitive resin composition

#5 | 2005-08-23

US9953941

Radiation-sensitive resin composition

#6 | 2005-01-04

US10046080

Radiation-sensitive resin composition

InventorID:

6101516 ⎘