Nirasaki
Japan
12
2016-06-09
The entities that hold a legal rights for patent applications filed by inventor Shimura Satoru:
Satoru Shimura from Nirasaki, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory medium
#2 | 2014-09-11Substrate treatment method, non-transitory computer storage medium and substrate treatment system
#3 | 2014-09-11Substrate treatment method, non-transitory computer storage medium and substrate treatment system
#4 | 2014-06-19Film forming method, non-transitory computer storage medium and film forming apparatus
#5 | 2014-02-06Coating treatment method and coating treatment apparatus
#6 | 2009-09-03Method of manufacturing semiconductor device, and resist coating and developing system
#7 | 2008-03-06Apparatus for manufacturing a semiconductor device
#8 | 2007-10-18Substrate treatment method for etching a base film using a resist pattern
#9 | 2007-06-07Substrate processing apparatus and substrate processing method
#10 | 2007-04-24Substrate processing apparatus and substrate processing method
#11 | 2007-03-01Substrate cleaning device and substrate cleaning method
#12 | 2005-09-08Method for forming wiring of semiconductor device
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