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Inventor profile of:

Kunihiro Tada

City:

Nirasaki

Country:

Japan

Published Applications:

9

Last publication date:

2017-11-02

Top Assignees for applications by Kunihiro Tada

The entities that hold a legal rights for patent applications filed by inventor Tada Kunihiro:

TOKYO ELECTRON LIMITED 7 Tokyo, Japan
Tokyo Electron Limited 2 Minato-ku, Tokyo, Japan
TOKYO ELECTRON LIMITED 2 Tokyo-To, Japan
TOKYO ELECTRON LIMITED 1 Minato-ku, Japan

Recent patent applications by Tada Kunihiro

Kunihiro Tada from Nirasaki, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2017-11-02

US20170314130A1

Chemistry; metallurgy

Deposition device and deposition method

#2 | 2010-09-09

US20100227062A1

Chemistry; metallurgy

Ti-containing film formation method and storage medium

#3 | 2008-12-11

US20080302781A1

Chemistry; metallurgy

Processing apparatus and heater unit

#4 | 2007-12-20

US20070292598A1

Chemistry; metallurgy

Substrate processing method and substrate processing apparatus

#5 | 2007-11-08

US20070257372A1

Method for forming Ti film and TiN film, contact structure, computer readable storing medium and computer program

#6 | 2006-12-26

US10868936

TiSiN film forming method, diffusion barrier TiSiN film, semiconductor device, method of fabricating the same and TiSiN film forming system

#7 | 2005-07-19

US10148952

Method for forming TiSiN film, diffusion preventive film comprising TiSiN film, semiconductor device and its production method, and apparatus for forming TiSiN film

#8 | 2005-06-23

US20050136660A1

Method of forming titanium film by CVD

#9 | 2005-01-11

US10216398

Method of forming titanium film by CVD

InventorID:

6145981 ⎘