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Inventor profile of:

Glenn Kuchenbeiser

City:

Newark, Delaware

Country:

United States

Published Applications:

Last publication date:

2021-03-25

Top Assignees for applications by Glenn Kuchenbeiser

The entities that hold a legal rights for patent applications filed by inventor Kuchenbeiser Glenn:

American Air Liquide, Inc. 12 Fremont, CA United States
L'Air Liquide Societe Anonyme Pour L'Etude Et L'Exploitation Des Procedes Georges Claude 5 Paris, France
TOKYO ELECTRON LIMITED 1 Tokyo, Japan
L'Air Liquide, Societe Anonymepour L'Etude et L'Exploitation des Procedes Georges Claude 1 Paris, France
America Air Liquide, Inc. 1 Fremont, CA United States

Recent patent applications by Kuchenbeiser Glenn

Glenn Kuchenbeiser from Newark, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2021-03-25

US20210087406A1

Chemistry; metallurgy

Perhydropolysilazane compositions and methods for forming oxide films using same

#2 | 2020-09-03

US20200277190A1

Chemistry; metallurgy

N—H free and Si-rich per-hydridopolysilzane compositions, their synthesis, and applications

#3 | 2018-12-13

US20180355483A1

Chemistry; metallurgy

Organosilane precursors for ALD/CVD silicon-containing film applications and methods of using the same

#4 | 2018-03-15

US20180072571A1

Chemistry; metallurgy

N—H free and SI-rich per-hydridopolysilzane compositions, their synthesis, and applications

#5 | 2017-10-19

US20170298510A1

Chemistry; metallurgy

Organodisilane precursors for ALD/CVD silicon-containing film applications

#6 | 2017-07-11

US14985006

Chemistry; metallurgy

Synthesis methods for amino(halo)silanes

#7 | 2017-07-06

US20170190720A1

Chemistry; metallurgy

ALKYLAMINO-SUBSTITUTED CARBOSILANE PRECURSORS

#8 | 2016-10-27

US20160314962A1

Electricity

CYCLIC ORGANOAMINOSILANE PRECURSORS FOR FORMING SILICON-CONTAINING FILMS AND METHODS OF USING THE SAME

#9 | 2016-07-05

US14336536

Chemistry; metallurgy

Sulfur containing organosilane precursors for ALD/CVD silicon-containing film applications

#10 | 2016-06-02

US20160152640A1

Chemistry; metallurgy

Hexacoordinate silicon-containing precursors for ALD/CVD silicon-containing film applications

#11 | 2016-04-28

US20160115593A1

Chemistry; metallurgy

Amino(iodo)silane precursors for ALD/CVD silicon-containing film applications and methods of using the same

#12 | 2016-04-21

US20160108064A1

Chemistry; metallurgy

Methods of using amino(bromo)silane precursors for ALD/CVD silicon-containing film applications

#13 | 2015-06-18

US20150166577A1

Chemistry; metallurgy

Organosilane precursors for ALD/CVD silicon-containing film applications

#14 | 2015-06-18

US20150166576A1

Chemistry; metallurgy

Organosilane precursors for ALD/CVD silicon-containing film applications

#15 | 2015-01-01

US20150004317A1

Electricity

Organosilane precursors for ALD/CVD silicon-containing film applications

#16 | 2014-10-30

US20140322924A1

Electricity

SILICON CONTAINING COMPOUNDS FOR ALD DEPOSITION OF METAL SILICATE FILMS

#17 | 2014-01-16

US20140017907A1

Electricity

Nitridation of atomic layer deposited high-k dielectrics using trisilylamine

InventorID:

614754 ⎘