🔗 Permalink

Inventor profile of:

Hideharu Kyouda

City:

Koshi

Country:

Japan

Published Applications:

Last publication date:

2018-10-25

Top Assignees for applications by Hideharu Kyouda

The entities that hold a legal rights for patent applications filed by inventor Kyouda Hideharu:

TOKYO ELECTRON LIMITED 14 Tokyo, Japan
TOKYO ELECTRON LIMITED 11 Minato-ku, Japan
TOKYO ELECTRON LIMITED 6 Tokyo-To, Japan
Tokyo Electron Limited 1 Minato-ku, Tokyo, Japan
Tokyo Electronic Limited 1 Tokyo-To, Japan

Recent patent applications by Kyouda Hideharu

Hideharu Kyouda from Koshi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2018-10-25

US20180308719A1

Electricity

Liquid processing apparatus

#2 | 2017-03-30

US20170090291A1

Physics

Developing method, developing apparatus and storage medium

#3 | 2017-02-16

US20170045821A1

Physics

Developing apparatus, developing method and storage medium

#4 | 2015-02-05

US20150036110A1

Physics

Developing apparatus, developing method and storage medium

#5 | 2015-02-05

US20150036109A1

Physics

Developing method, developing apparatus and storage medium

#6 | 2015-01-29

US20150027503A1

Electricity

Liquid processing apparatus

#7 | 2015-01-29

US20150027492A1

Performing operations; transporting

Substrate cleaning apparatus, substrate cleaning method, and storage medium

#8 | 2013-11-07

US20130293856A1

Electricity

Coating and developing apparatus, coating film forming method, and storage medium storing program for performing the method

#9 | 2012-06-07

US20120140191A1

Physics

Coating and developing apparatus, coating and developing method, and storage medium

#10 | 2011-10-06

US20110240597A1

Chemistry; metallurgy

Substrate treatment method, coating film removing apparatus, and substrate treatment system

#11 | 2011-08-18

US20110200923A1

Electricity

Substrate treatment method

#12 | 2011-06-30

US20110155693A1

Electricity

Substrate treatment method, coating treatment apparatus, and substrate treatment system

#13 | 2011-06-02

US20110127236A1

Physics

Developing device and developing method

#14 | 2010-12-30

US20100330508A1

Electricity

Developing apparatus and developing method

#15 | 2010-09-16

US20100232781A1

Physics

Coating and developing apparatus, coating and developing method, and storage medium

#16 | 2010-03-25

US20100073647A1

Physics

Coating film forming apparatus and coating film forming method for immersion light exposure

#17 | 2009-05-21

US20090130614A1

Electricity

Development device and development method

#18 | 2008-07-24

US20080176003A1

Electricity

Substrate treatment method, coating treatment apparatus, and substrate treatment system

#19 | 2008-07-03

US20080160781A1

Electricity

Substrate processing method, substrate processing system, and computer-readable storage medium

#20 | 2008-05-29

US20080124489A1

Electricity

Coating film forming apparatus and method

#21 | 2007-09-13

US20070212884A1

Electricity

Coating and developing apparatus, coating film forming method, and storage medium storing program for performing the method

#22 | 2007-08-09

US20070184392A1

Physics

Coating and developing method, coating and developing system and storage medium

#23 | 2007-08-09

US20070184178A1

Physics

Developing device and developing method

#24 | 2007-03-01

US20070044823A1

Electricity

Substrate cleaning device and substrate cleaning method

InventorID:

6189242 ⎘