Nirasaki
Japan
16
2020-12-31
The entities that hold a legal rights for patent applications filed by inventor Hishiya Shingo:
Shingo Hishiya from Nirasaki, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Gas introduction structure, thermal processing apparatus and gas supply method
#2 | 2019-09-19Cleaning method and film forming apparatus
#3 | 2019-06-20Vertical heat treatment apparatus
#4 | 2019-05-02Method of forming blocking silicon oxide film, and storage medium
#5 | 2019-03-14Method and apparatus for forming silicon oxide film, and storage medium
#6 | 2015-09-17Film forming method, film forming apparatus and storage medium
#7 | 2014-10-02Driving method of vertical heat treatment apparatus, storage medium and vertical heat treatment apparatus
#8 | 2013-08-08Method of manufacturing capacitor, capacitor and method of forming dielectric film for use in capacitor
#9 | 2012-09-27Film forming method, film forming apparatus, and storage medium
#10 | 2012-08-30Method of forming titanium nitride film
#11 | 2012-03-29Semiconductor device, method of manufacturing the same and adsorption site blocking atomic layer deposition method
#12 | 2012-03-22Liquid processing method, recording medium having recorded program for executing liquid processing method therein and liquid processing apparatus
#13 | 2011-12-08Film formation method and film formation apparatus
#14 | 2009-10-08Reaction tube and heat processing apparatus for a semiconductor process
#15 | 2007-04-24Method and apparatus for treating article to be treated
#16 | 2006-06-20Oxide film forming method
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