Inventor profile of:

Keisuke Suzuki

City:

Nirasaki

Country:

Japan

Published Applications:

15

Last publication date:

2019-09-05

Top Assignees for applications by Keisuke Suzuki

The entities that hold a legal rights for patent applications filed by inventor Suzuki Keisuke:

Recent patent applications by Suzuki Keisuke

Keisuke Suzuki from Nirasaki, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2019-09-05
US20190271074A1
Chemistry; metallurgy

Film-forming method and film-forming apparatus

#2 | 2019-06-20
US20190186014A1
Chemistry; metallurgy

Vertical heat treatment apparatus

#3 | 2019-05-02
US20190131126A1
Electricity

Method of forming blocking silicon oxide film, and storage medium

#4 | 2015-09-24
US20150267293A1
Chemistry; metallurgy

Operating method of vertical heat treatment apparatus, storage medium, and vertical heat treatment apparatus

#5 | 2015-09-17
US20150259796A1
Chemistry; metallurgy

Film forming method, film forming apparatus and storage medium

#6 | 2014-10-02
US20140295676A1
Electricity

Method of operating vertical heat treatment apparatus, vertical heat treatment apparatus and non-transitory recording medium

#7 | 2014-10-02
US20140295082A1
Chemistry; metallurgy

Driving method of vertical heat treatment apparatus, storage medium and vertical heat treatment apparatus

#8 | 2014-07-31
US20140213067A1
Electricity

Film forming method

#9 | 2013-12-05
US20130323935A1
Electricity

Film forming method and apparatus

#10 | 2013-10-03
US20130260576A1
Electricity

Method of forming boron-containing silicon oxycarbonitride film and method of forming silicon oxycarbonitride film

#11 | 2013-06-27
US20130164946A1
Electricity

Method of forming silicon oxycarbonitride film

#12 | 2013-02-14
US20130037873A1
Electricity

Film forming method for forming boron-added silicon nitride film

#13 | 2012-12-20
US20120321791A1
Chemistry; metallurgy

Film forming method and film forming apparatus

#14 | 2011-06-02
US20110129619A1
Electricity

Film formation method and apparatus

#15 | 2011-01-27
US20110021033A1
Chemistry; metallurgy

Batch CVD method and apparatus for semiconductor process

InventorID:

6257532 ⎘