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Inventor profile of:

Eiichiro Nishimura

City:

Ome

Country:

Japan

Published Applications:

7

Last publication date:

2017-11-30

Top Assignees for applications by Eiichiro Nishimura

The entities that hold a legal rights for patent applications filed by inventor Nishimura Eiichiro:

SUMITOMO METAL MINING CO., LTD. 7 Tokyo, Japan

Recent patent applications by Nishimura Eiichiro

Eiichiro Nishimura from Ome, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2017-11-30

US20170345653A1

Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target

#2 | 2017-05-11

US20170130329A1

Chemistry; metallurgy

Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target

#3 | 2017-03-30

US20170092780A1

Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target

#4 | 2017-02-02

US20170029336A1

Chemistry; metallurgy

Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target

#5 | 2017-02-02

US20170029335A1

Chemistry; metallurgy

Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target

#6 | 2016-12-01

US20160348230A1

Chemistry; metallurgy

Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target

#7 | 2016-12-01

US20160348229A1

Chemistry; metallurgy

Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target

InventorID:

6427836 ⎘