Inventor profile of:

Paul Janis Timans

City:

Mountain View, California

Country:

United States

Published Applications:

29

Last publication date:

2015-04-02

Top Assignees for applications by Paul Janis Timans

The entities that hold a legal rights for patent applications filed by inventor Timans Paul Janis:

Recent patent applications by Timans Paul Janis

Paul Janis Timans from Mountain View, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2015-04-02
US20150092813A1
Physics

System and process for calibrating pyrometers in thermal processing chambers

#2 | 2014-09-04
US20140246422A1
Electricity

Heating Configuration for Use in Thermal Processing Chambers

#3 | 2013-01-31
US20130028286A1
Physics

System and process for calibrating pyrometers in thermal processing chambers

#4 | 2012-11-29
US20120298039A1
Electricity

METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE MINIMIZING IMPACT ON EXISTING STRUCTURES

#5 | 2012-10-04
US20120252229A1
Electricity

System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy

#6 | 2012-09-13
US20120231558A1
Electricity

Method and system for determining optical properties of semiconductor wafers

#7 | 2012-08-09
US20120201271A1
Physics

Methods for determining wafer temperature

#8 | 2011-09-15
US20110222840A1
Electricity

Heating Configuration For Use in Thermal Processing Chambers

#9 | 2011-09-08
US20110216803A1
Physics

System and process for calibrating pyrometers in thermal processing chambers

#10 | 2010-10-07
US20100252547A1
Electricity

SYSTEM AND METHOD FOR REDUCING OBJECT DEFORMATION DURING A PULSED HEATING PROCESS

#11 | 2010-09-16
US20100232470A1
Physics

System and process for calibrating pyrometers in thermal processing chambers

#12 | 2010-06-17
US20100151694A1
Electricity

Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures

#13 | 2010-06-08
US10178950
-

System and process for calibrating pyrometers in thermal processing chambers

#14 | 2009-10-01
US20090245320A1
Physics

Methods for determining wafer temperature

#15 | 2009-10-01
US20090242543A1
Physics

Monitoring witness structures for temperature control in RTP systems

#16 | 2009-06-25
US20090161724A1
Physics

Determining the temperature of silicon at high temperatures

#17 | 2009-04-16
US20090098742A1
Electricity

System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy

#18 | 2008-02-28
US20080050688A1
Electricity

System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy

#19 | 2008-01-10
US20080008460A1
Electricity

System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy

#20 | 2008-01-03
US20080002753A1
Physics

Methods for determining wafer temperature

#21 | 2007-12-27
US20070297775A1
Electricity

Heating configuration for use in thermal processing chambers

#22 | 2007-01-25
US20070020784A1
Electricity

Method and system for determining optical properties of semiconductor wafers

#23 | 2006-12-28
US20060291833A1
Electricity

Switchable reflector wall concept

#24 | 2006-12-28
US20060289434A1
Electricity

Apparatus and method for reducing stray light in substrate processing chambers

#25 | 2006-12-28
US20060289433A1
Electricity

Optimizing the thermal budget during a pulsed heating process

#26 | 2006-03-21
US10040272
-

System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy

#27 | 2005-11-29
US9747522
-

Heating configuration for use in thermal processing chambers

#28 | 2005-09-29
US20050213949A1
Electricity

Heating configuration for use in thermal processing chambers

#29 | 2005-05-12
US20050098552A1
Electricity

Apparatus and method for reducing stray light in substrate processing chambers

InventorID:

64657 ⎘