Muhammad M. RASHEED

VAPOR DEPOSITION CHAMBER WITH IN-SITU FLOW CONDUCTANCE OPTIMIZATION

#2 | 2023-11-09

US20230357927A1

ALD cycle time reduction using process chamber lid with tunable pumping

#3 | 2023-09-28

US20230307216A1

ENHANCED CHAMBER CLEAN AND RECOVERY WITH DUAL FLOW PATH

#4 | 2023-04-27

US20230125613A1

Heater cover plate for uniformity improvement

#5 | 2023-01-19

US20230015613A1

High temperature vacuum seal

#6 | 2022-12-08

US20220389585A1

High temperature chemical vapor deposition lid

#7 | 2022-11-17

US20220364575A1

Pumping liner for improved flow uniformity

#8 | 2022-11-10

US20220356572A1

Pumping Liners with Self-Adjusting Pumping Conductance

#9 | 2022-10-27

US20220344134A1

Process kit for a substrate support

#10 | 2022-05-26

US20220162752A1

Methods and apparatus to reduce pressure fluctuations in an ampoule of a chemical delivery system

#11 | 2022-03-03

US20220064785A1

APPARATUS AND METHODS FOR GAS PHASE PARTICLE REDUCTION

#12 | 2022-02-10

US20220042617A1

Valve for varying flow conductance under vacuum

#13 | 2021-12-30

US20210404059A1

PROCESSING SYSTEM AND METHOD OF CONTROLLING CONDUCTANCE IN A PROCESSING SYSTEM

#14 | 2021-12-23

US20210395892A1

High temperature chemical vapor deposition lid

#15 | 2021-11-04

US20210343557A1

Heater cover plate for uniformity improvement

#16 | 2021-10-14

US20210317577A1

High temperature vacuum seal

#17 | 2021-08-26

US20210262092A1

SEQUENTIAL PULSE AND PURGE FOR ALD PROCESSES

#18 | 2021-08-12

US20210246552A1

Lids and lid assembly kits for atomic layer deposition chambers

#19 | 2021-07-29

US20210231242A1

Performing operations; transporting

Apparatus and methods to prevent particle entry into gas lines

#20 | 2021-06-24

US20210187521A1

Showerhead for ALD precursor delivery

#21 | 2021-05-06

US20210130953A1

Process kit for improving edge film thickness uniformity on a substrate

#22 | 2021-03-25

US20210087686A1

ALD cycle time reduction using process chamber lid with tunable pumping

#23 | 2020-12-03

US20200378402A1

Pumping liner for improved flow uniformity

#24 | 2020-12-03

US20200377998A1

APPARATUS FOR IMPROVED FLOW CONTROL IN PROCESS CHAMBERS

#25 | 2020-11-12

US20200357616A1

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS

#26 | 2020-03-19

US20200087789A1

Apparatus for multi-flow precursor dosage

#27 | 2019-12-26

US20190390337A1

High temperature rotation module for a processing chamber

#28 | 2019-07-25

US20190229007A1

Process kit for a substrate support

#29 | 2019-03-14

US20190078725A1

Gimbal assembly for heater pedestal

#30 | 2019-03-14

US20190078205A1

Apparatus and method for providing a uniform flow of gas

#31 | 2019-02-14

US20190048467A1

SHOWERHEAD AND PROCESS CHAMBER INCORPORATING SAME

#32 | 2019-01-31

US20190032210A1

Quick disconnect resistance temperature detector assembly for rotating pedestal

#33 | 2018-12-13

US20180358768A1

Slip ring for use in rotatable substrate support

#34 | 2018-06-07

US20180155838A1

Process kit design for in-chamber heater and wafer rotating mechanism

#35 | 2017-12-07

US20170350001A1

Sputtering target for PVD chamber

#36 | 2017-10-05

US20170283947A1

Apparatus and method for providing a uniform flow of gas

#37 | 2017-02-02

US20170029941A1

High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process

#38 | 2016-11-03

US20160319428A1

Oxidized showerhead and process kit parts and methods of using same

#39 | 2016-10-27

US20160312360A1

Atomic layer deposition chamber with funnel-shaped gas dispersion channel and gas distribution plate

#40 | 2016-04-07

US20160097119A1

Performing operations; transporting

Atomic layer deposition chamber with thermal lid

#41 | 2016-02-25

US20160052772A1

Methods and apparatus for liquid chemical delivery

#42 | 2015-12-03

US20150345019A1

METHOD AND APPARATUS FOR IMPROVING GAS FLOW IN A SUBSTRATE PROCESSING CHAMBER

#43 | 2015-07-23

US20150203960A1

Target retaining apparatus

#44 | 2015-06-18

US20150170888A1

Physical vapor deposition (PVD) target having low friction pads

#45 | 2015-03-19

US20150075980A1

Extended dark space shield

#46 | 2014-09-18

US20140262763A1

Selectively groundable cover ring for substrate process chambers

#47 | 2014-08-28

US20140238843A1

Variable radius dual magnetron

#48 | 2014-04-24

US20140110248A1

CHAMBER PASTING METHOD IN A PVD CHAMBER FOR REACTIVE RE-SPUTTERING DIELECTRIC MATERIAL

#49 | 2014-02-13

US20140042016A1

Low resistivity tungsten PVD with enhanced ionization and RF power coupling

#50 | 2012-08-23

US20120211354A1

Uniformity tuning capable ESC grounding kit for RF PVD chamber

#51 | 2012-08-09

US20120199469A1

PVD sputtering target with a protected backing plate

#52 | 2011-12-15

US20110303960A1

Semiconductor device with gate electrode stack including low resistivity tungsten and method of forming

#53 | 2011-09-01

US20110209995A1

Physical Vapor Deposition With A Variable Capacitive Tuner and Feedback Circuit

#54 | 2011-02-17

US20110036709A1

PROCESS KIT FOR RF PHYSICAL VAPOR DEPOSITION

#55 | 2010-10-07

US20100252417A1

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS

#56 | 2010-10-07

US20100252416A1

Sputtering target for PVD chamber

#57 | 2010-02-25

US20100048028A1

Surface treated aluminum nitride baffle

#58 | 2009-03-12

US20090068433A1