Seoul
South Korea
33
2014-02-13
The entities that hold a legal rights for patent applications filed by inventor Eun Byung Soo:
Byung Soo Eun from Seoul, KR has applied for patents for these inventions. The list has both pending applications and granted patents:
Method for fabricating an inter dielectric layer in semiconductor device
#2 | 2012-10-25METHOD FOR FORMING ISOLATION LAYER IN SEMICONDUCTOR DEVICE
#3 | 2011-10-20Semiconductor device for preventing the leaning of storage nodes and method for manufacturing the same
#4 | 2011-06-02Isolation structure in a memory device
#5 | 2011-03-17Method for fabricating storage node electrode in semiconductor device
#6 | 2010-12-30Method for fabricating bitline in semiconductor device
#7 | 2010-07-01Method for insulating wires of semiconductor device
#8 | 2010-06-24Method for fabricating cylinder type capacitor
#9 | 2010-05-20METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE HAVING STEP GATES
#10 | 2010-04-01Semiconductor device having recess gate and isolation structure and method for fabricating the same
#11 | 2010-03-04Capacitor of semiconductor device and method for forming the same
#12 | 2009-10-29Semiconductor device for preventing the leaning of storage nodes
#13 | 2009-10-15Isolation structure in memory device and method for fabricating the isolation structure
#14 | 2009-10-01Isolation structure in memory device and method for fabricating the same
#15 | 2009-05-21Trench isolation structure in a semiconductor device and method for fabricating the same
#16 | 2009-03-12Method for forming isolation layer in semiconductor device
#17 | 2009-03-12Method for forming isolation layer in semiconductor device
#18 | 2009-01-01Method for fabricating an inter dielectric layer in semiconductor device
#19 | 2009-01-01METHOD FOR FABRICATING AN INTERLAYER DIELECTRIC IN A SEMICONDUCTOR DEVICE
#20 | 2008-12-25Method for forming storage electrode of semiconductor memory device
#21 | 2008-12-25Semiconductor device having a recess channel and method for fabricating the same
#22 | 2008-10-16Method for Fabricating Isolation Layer in Semiconductor Device
#23 | 2008-07-03Method for fabricating a dual poly gate in semiconductor device
#24 | 2008-07-03Method for fabricating isolation film in semiconductor device
#25 | 2008-03-20Semiconductor Device Manufacturing Method
#26 | 2008-01-31Bit line barrier metal layer for semiconductor device and process for preparing the same
#27 | 2008-01-03Method for manufacturing semiconductor device free from layer-lifting between insulating layers
#28 | 2007-10-04Method for forming isolation layer in semiconductor device
#29 | 2007-02-01Method for fabricating semiconductor device and semiconductor device fabricated using the same
#30 | 2006-11-23Trench isolation structure in a semiconductor device and method for fabricating the same
#31 | 2006-10-26Semiconductor device having a recess channel and method for fabricating the same
#32 | 2006-10-05Semiconductor device having step gates and method of manufacturing the same
#33 | 2006-06-08Bit line barrier metal layer for semiconductor device and process for preparing the same
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