Mitsuya Utsuno

City:

Tama

Country:

Japan

Published Applications:

Last publication date:

2020-11-19

Top Assignees for applications by Mitsuya Utsuno

The entities that hold a legal rights for patent applications filed by inventor Utsuno Mitsuya:

Mitsuya Utsuno from Tama, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition

Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition

InventorID:

6522181 ⎘