Rita Vos

City:

Tremelo

Country:

Belgium

Published Applications:

Last publication date:

2016-02-04

Top Assignees for applications by Rita Vos

The entities that hold a legal rights for patent applications filed by inventor Vos Rita:

Interuniversitair Microelektronica Centrum (IMEC) 4 Leuven, Belgium
AIR PRODUCTS AND CHEMICALS, INC. 2 Allentown, PA United States
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 2 Hsin-Chu, Taiwan
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 2 Hsinchu, Taiwan
IMEC VZW 1 Leuven, Belgium
Taiwan Semiconductor Manufacturing Company, Ltd. (TSMC) 1 HsinChu, Taiwan
GLOBALFOUNDRIES Inc. 1 Grand Cayman, Cayman Islands
Dainippon Screen Mfg. Co., Ltd. 1 , Japan
IMEC 1 , Belgium
Katholieke Universiteit Leuven 1 Leuven, Belgium
Interuniversitair Microelektronica Centrum (IMEC) vzw 1 Leuven, Belgium
Taiwan Semiconductor Maunfacturing Company, Ltd. 1 HsinChu, Taiwan
IMEC 1 Leuven, Belgium
Interuniversitair Microelektronica Centrum vzw (IMEC) 1 Leuven, Belgium
Katholieke Universiteit Leuven, K.U.LEUVEN R&D 1 Leuven, Belgium

Recent patent applications by Vos Rita

Rita Vos from Tremelo, BE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2016-02-04

US20160035575A1

Electricity

Methods of forming a semiconductor device by thermally treating a cleaned surface of a semiconductor substrate in a non-oxidizing ambient

#2 | 2014-03-06

US20140061735A1

Electricity

Method for manufacturing a transistor device comprising a germanium based channel layer

#3 | 2010-12-16

US20100317185A1

Electricity

Substrate treating method and method of manufacturing semiconductor device using the same

#4 | 2009-09-10

US20090223832A1

Electricity

Method and Apparatus for Preventing Galvanic Corrosion in Semiconductor Processing

#5 | 2009-05-07

US20090117750A1

Electricity

Methods of forming a semiconductor device

#6 | 2008-08-14

US20080191286A1

Electricity

Methods for manufacturing a CMOS device with dual dielectric layers

#7 | 2006-11-02

US20060247142A1

Chemistry; metallurgy

Composition and method for treating a semiconductor substrate

#8 | 2006-04-27

US20060089280A1

Electricity

Semiconductor cleaning solution

#9 | 2005-07-21

US20050159323A1

Chemistry; metallurgy

Composition and method for treating a semiconductor substrate

#10 | 2005-01-13

US20050009207A1

Chemistry; metallurgy

Composition comprising an oxidizing and complexing compound

InventorID:

672182 ⎘