Hans Eisenmann

City:

Munich

Country:

Germany

Published Applications:

Last publication date:

2025-03-13

Top Assignees for applications by Hans Eisenmann

The entities that hold a legal rights for patent applications filed by inventor Eisenmann Hans:

Hans Eisenmann from Munich, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

USE OF LAYOUT ANALYSIS TO ENABLE EFFICIENT AND EFFECTIVE RANDOM DEFECT INSPECTION USING A VECTOR-MODE E-BEAM INSPECTION MACHINE

Vertex based layout pattern (VEP): a method and apparatus for describing repetitive patterns in IC mask layout

InventorID:

6956347 ⎘