Inventor profile of:

Amit Kumar BANSAL

City:

Sunnyvale, California

Country:

United States

Published Applications:

23

Last publication date:

2026-04-23

Top Assignees for applications by Amit Kumar BANSAL

The entities that hold a legal rights for patent applications filed by inventor BANSAL Amit Kumar:

Recent patent applications by BANSAL Amit Kumar

Amit Kumar BANSAL from Sunnyvale, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-04-23
US20260111729A1
Physics

SYSTEM AND METHOD FOR TAG-DIRECTED DEEP-LEARNING-BASED FEATURES FOR PREDICTING EVENTS AND MAKING DETERMINATIONS

#2 | 2023-09-14
US20230289587A1
Physics

MULTI-DOMAIN FEATURE ENHANCEMENT FOR TRANSFER LEARNING (FTL)

#3 | 2022-03-03
US20220067510A1
Physics

SYSTEM AND METHOD FOR TAG-DIRECTED DEEP-LEARNING-BASED FEATURES FOR PREDICTING EVENTS AND MAKING DETERMINATIONS

#4 | 2019-08-15
US20190252158A1
Electricity

Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films

#5 | 2017-04-13
US20170101712A1
Chemistry; metallurgy

Showerhead assembly with multiple fluid delivery zones

#6 | 2016-12-08
US20160358804A1
Electricity

Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films

#7 | 2016-11-03
US20160322200A1
Electricity

Dual-channel showerhead for formation of film stacks

#8 | 2016-10-27
US20160315000A1
Electricity

External substrate rotation in a semiconductor processing system

#9 | 2016-08-04
US20160222507A1
Chemistry; metallurgy

Apparatus and method for purging gaseous compounds

#10 | 2016-05-26
US20160145742A1
Chemistry; metallurgy

Tunable ground planes in plasma chambers

#11 | 2016-01-21
US20160017497A1
Chemistry; metallurgy

PECVD process

#12 | 2016-01-14
US20160013022A1
Electricity

Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber

#13 | 2015-12-31
US20150380217A1
Electricity

Chamber design for semiconductor processing

#14 | 2015-12-31
US20150376780A1
Chemistry; metallurgy

Plasma corrosion resistive heater for high temperature processing

#15 | 2015-12-24
US20150371881A1
Electricity

Substrate temperature measurement in multi-zone heater

#16 | 2015-09-17
US20150262859A1
Electricity

Wafer rotation in a semiconductor chamber

#17 | 2015-08-13
US20150226540A1
Physics

PECVD apparatus and process

#18 | 2014-09-18
US20140264059A1
Electricity

LIGHT IRRADIANCE AND THERMAL MEASUREMENT IN UV AND CVD CHAMBERS

#19 | 2014-09-18
US20140263275A1
Electricity

ROTATION ENABLED MULTIFUNCTIONAL HEATER-CHILLER PEDESTAL

#20 | 2014-05-01
US20140118751A1
Physics

PECVD process

#21 | 2014-03-27
US20140087489A1
Electricity

Bottom and side plasma tuning having closed loop control

#22 | 2014-03-27
US20140083523A1
Mechanical engineering

Apparatus and method for purging gaseous compounds

#23 | 2014-03-27
US20140083361A1
Chemistry; metallurgy

Controlling temperature in substrate processing systems

InventorID:

698977 ⎘