Sunnyvale, California
United States
23
2026-04-23
The entities that hold a legal rights for patent applications filed by inventor BANSAL Amit Kumar:
Amit Kumar BANSAL from Sunnyvale, US has applied for patents for these inventions. The list has both pending applications and granted patents:
SYSTEM AND METHOD FOR TAG-DIRECTED DEEP-LEARNING-BASED FEATURES FOR PREDICTING EVENTS AND MAKING DETERMINATIONS
#2 | 2023-09-14MULTI-DOMAIN FEATURE ENHANCEMENT FOR TRANSFER LEARNING (FTL)
#3 | 2022-03-03SYSTEM AND METHOD FOR TAG-DIRECTED DEEP-LEARNING-BASED FEATURES FOR PREDICTING EVENTS AND MAKING DETERMINATIONS
#4 | 2019-08-15Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films
#5 | 2017-04-13Showerhead assembly with multiple fluid delivery zones
#6 | 2016-12-08Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films
#7 | 2016-11-03Dual-channel showerhead for formation of film stacks
#8 | 2016-10-27External substrate rotation in a semiconductor processing system
#9 | 2016-08-04Apparatus and method for purging gaseous compounds
#10 | 2016-05-26Tunable ground planes in plasma chambers
#11 | 2016-01-21PECVD process
#12 | 2016-01-14Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber
#13 | 2015-12-31Chamber design for semiconductor processing
#14 | 2015-12-31Plasma corrosion resistive heater for high temperature processing
#15 | 2015-12-24Substrate temperature measurement in multi-zone heater
#16 | 2015-09-17Wafer rotation in a semiconductor chamber
#17 | 2015-08-13PECVD apparatus and process
#18 | 2014-09-18LIGHT IRRADIANCE AND THERMAL MEASUREMENT IN UV AND CVD CHAMBERS
#19 | 2014-09-18ROTATION ENABLED MULTIFUNCTIONAL HEATER-CHILLER PEDESTAL
#20 | 2014-05-01PECVD process
#21 | 2014-03-27Bottom and side plasma tuning having closed loop control
#22 | 2014-03-27Apparatus and method for purging gaseous compounds
#23 | 2014-03-27Controlling temperature in substrate processing systems
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