Inventor profile of:

Peter Ten Berge

City:

Eindhoven

Country:

Netherlands

Published Applications:

29

Last publication date:

2024-02-08

Top Assignees for applications by Peter Ten Berge

The entities that hold a legal rights for patent applications filed by inventor Ten Berge Peter:

Recent patent applications by Ten Berge Peter

Peter Ten Berge from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-02-08
US20240045340A1
Physics

METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPARATUSES

#2 | 2023-06-08
US20230176490A1
Physics

METHOD FOR OPTIMIZING A SAMPLING SCHEME AND ASSOCIATED APPARATUSES

#3 | 2023-04-06
US20230108481A1
Physics

Method for controlling a manufacturing process and associated apparatuses

#4 | 2022-01-27
US20220027437A1
Physics

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

#5 | 2021-10-21
US20210325788A1
Physics

Method to predict yield of a device manufacturing process

#6 | 2021-07-15
US20210215622A1
Physics

Methods and apparatus for measuring a property of a substrate

#7 | 2020-10-08
US20200319118A1
Physics

Methods and apparatus for measuring a property of a substrate

#8 | 2020-04-23
US20200124989A1
Physics

Method and system for increasing accuracy of pattern positioning

#9 | 2020-04-02
US20200103761A1
Physics

Method to predict yield of a device manufacturing process

#10 | 2019-10-03
US20190301850A1
Physics

Methods and apparatus for measuring a property of a substrate

#11 | 2019-08-22
US20190258178A1
Physics

Method for determining an optimized set of measurement locations for measurement of a parameter of a lithographic process, metrology system and computer program products for implementing such methods

#12 | 2019-07-11
US20190214318A1
Electricity

METHOD AND APPARATUS TO MONITOR A PROCESS APPARATUS

#13 | 2018-11-08
US20180322237A1
Physics

Method and apparatus to correct for patterning process error

#14 | 2018-11-01
US20180314168A1
Physics

Method and apparatus to reduce effects of nonlinear behavior

#15 | 2018-10-25
US20180307135A1
Physics

Method and apparatus to correct for patterning process error

#16 | 2018-10-18
US20180299770A1
Physics

METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

#17 | 2018-09-06
US20180252998A1
Physics

Method and apparatus to correct for patterning process error

#18 | 2018-03-08
US20180067900A1
Physics

Method and apparatus for inspection and metrology

#19 | 2017-06-08
US20170160073A1
Physics

Methods and apparatus for measuring a property of a substrate

#20 | 2014-12-04
US20140354969A1
Physics

Methods and apparatus for measuring a property of a substrate

#21 | 2014-03-27
US20140089870A1
Physics

Inspection method and apparatus and lithographic processing cell

#22 | 2010-03-11
US20100060869A1
Physics

LITHOGRAPHIC APPARATUS AND ALIGNMENT METHOD

#23 | 2008-05-22
US20080117402A1
Electricity

Lithographic apparatus and method

#24 | 2008-04-10
US20080085462A1
Physics

Lithographic apparatus and device manufacturing method

#25 | 2007-11-22
US20070266875A1
Performing operations; transporting

Imprint lithographic apparatus, device manufacturing method and device manufactured thereby

#26 | 2007-01-25
US20070019177A1
Physics

Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method

#27 | 2006-12-21
US20060285095A1
Physics

Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method

#28 | 2006-08-03
US20060172507A1
Electricity

Method and system for 3D alignment in wafer scale integration

#29 | 2005-06-02
US20050118781A1
Physics

Substrate, method of preparing a substrate, method of measurement, lithographic apparatus, device manufacturing method and device manufactured thereby, and machine-readable storage medium

InventorID:

707285 ⎘