Phoenix, Arizona
United States
20
2022-11-24
The entities that hold a legal rights for patent applications filed by inventor Schlueter James Allen:
James Allen Schlueter from Phoenix, US has applied for patents for these inventions. The list has both pending applications and granted patents:
With-In Die Non-Uniformities (WID-NU) In Planarization
#2 | 2020-10-01Low Temperature Mechanical Polishing Or Planarization Slurry For Surfactant Solubility
#3 | 2020-09-03Chemical Mechanical Polishing For Copper And Through Silicon Via Applications
#4 | 2020-04-02Barrier Slurry Removal Rate Improvement
#5 | 2020-03-12Chemical mechanical planarization for tungsten-containing substrates
#6 | 2017-12-21Chemical mechanical polishing (CMP) of cobalt-containing substrate
#7 | 2016-12-08Barrier chemical mechanical planarization slurries using ceria-coated silica abrasives
#8 | 2016-10-27Low dishing copper chemical mechanical planarization
#9 | 2016-06-23Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof
#10 | 2016-01-28Chemical mechanical polishing (CMP) of cobalt-containing substrate
#11 | 2015-09-03Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof
#12 | 2015-05-14Chemical mechanical polishing slurry compositions and method using the same for copper and through-silicon via applications
#13 | 2015-04-16Barrier chemical mechanical planarization composition and method thereof
#14 | 2015-04-16BARRIER CHEMICAL MECHANICAL PLANARIZATION COMPOSITION AND METHOD THEREOF
#15 | 2015-01-01Chemical mechanical polishing slurry compositions and method using the same for copper and through-silicon via applications
#16 | 2014-12-25Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof
#17 | 2014-09-18Chemical Mechanical Planarization for Tungsten-Containing Substrates
#18 | 2014-04-24Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof
#19 | 2014-04-10Chemical mechanical polishing composition having chemical additives and methods for using same
#20 | 2009-03-05Method for chemical mechanical planarization of chalcogenide materials
719621 ⎘