München
Germany
3
2008-07-01
The entities that hold a legal rights for patent applications filed by inventor Dettmann Wolfgang:
Wolfgang Dettmann from München, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer
#2 | 2008-07-01Set of at least two masks for the projection of structure patterns
#3 | 2006-05-16Mask with programmed defects and method for the fabrication thereof
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