Marilyn I. Wright

City:

Sunnyvale, California

Country:

United States

Published Applications:

Last publication date:

2006-09-19

Top Assignees for applications by Marilyn I. Wright

The entities that hold a legal rights for patent applications filed by inventor Wright Marilyn I.:

ADVANCED MICRO DEVICES, INC. 2 Sunnyvale, CA United States
ADVANCED MICRO DEVICES 1 Sunnyvale, CA United States
AMD Inc. 1 Sunnyvale, CA United States
Motorola, Inc. 1 Schaumberg, IL United States

Recent patent applications by Wright Marilyn I.

Marilyn I. Wright from Sunnyvale, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2006-09-19

US10430711

Capping layer for reducing amorphous carbon contamination of photoresist in semiconductor device manufacture; and process for making same

#2 | 2005-07-05

US10366800

Method for patterning a feature using a trimmed hardmask

#3 | 2005-05-31

US10299427

Antireflective bi-layer hardmask including a densified amorphous carbon layer

#4 | 2005-05-17

US10755911

L-shaped spacer incorporating or patterned using amorphous carbon or CVD organic materials

InventorID:

7397791 ⎘