Austin, Texas
United States
52
2025-05-08
The entities that hold a legal rights for patent applications filed by inventor Ventzek Peter:
Peter Ventzek from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:
SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING
#2 | 2025-03-06Methods for Extreme Ultraviolet (EUV) Resist Patterning Development
#3 | 2025-01-16GAS CLUSTER ASSISTED PLASMA PROCESSING
#4 | 2024-10-17SYSTEMS FOR REAL-TIME PULSE MEASUREMENT AND PULSE TIMING ADJUSTMENT TO CONTROL PLASMA PROCESS PERFORMANCE
#5 | 2023-10-26Methods for extreme ultraviolet (EUV) resist patterning development
#6 | 2023-07-20Method and Apparatus for Plasma Processing
#7 | 2022-11-17Methods for real-time pulse measurement and pulse timing adjustment to control plasma process performance
#8 | 2022-10-27Method of forming a FET structure by selective deposition of film on source/drain contact
#9 | 2022-09-29Fast neutral generation for plasma processing
#10 | 2022-08-04Contact Etch Stop Layer with Improved Etch Stop Capability
#11 | 2022-08-04Cyclic plasma etch process
#12 | 2022-06-09Defect correction on metal resists
#13 | 2022-05-24Methods for anisotropic etch of silicon-based materials with selectivity to organic materials
#14 | 2022-03-31Quantification of processing chamber species by electron energy sweep
#15 | 2022-03-24Cyclic low temperature film growth processes
#16 | 2022-03-10Impedance matching apparatus and control method
#17 | 2022-03-03Gas cluster assisted plasma processing
#18 | 2022-03-03Plasma processing systems and methods for chemical processing a substrate
#19 | 2022-03-01Ion angle detector
#20 | 2022-02-24Pulsed capacitively coupled plasma processes
#21 | 2022-01-27Plasma Processing Methods Using Low Frequency Bias Pulses
#22 | 2022-01-27Broadband plasma processing systems and methods
#23 | 2021-09-23Method for dry etching compound materials
#24 | 2021-08-12Plasma processing methods using low frequency bias pulses
#25 | 2021-07-08Methods of Plasma Processing Using a Pulsed Electron Beam
#26 | 2021-05-20Mode-switching plasma systems and methods of operating thereof
#27 | 2021-03-18Plasma processing apparatuses including multiple electron sources
#28 | 2021-03-18Broadband plasma processing systems and methods
#29 | 2021-03-18Broadband plasma processing systems and methods
#30 | 2021-02-18Three-phase pulsing systems and methods for plasma processing
#31 | 2021-01-28Mode-switching plasma systems and methods of operating thereof
#32 | 2021-01-21EQUIPMENT AND METHODS FOR PLASMA PROCESSING
#33 | 2021-01-14Process control enabled VDC sensor for plasma process
#34 | 2020-12-03Method for dry etching compound materials
#35 | 2020-11-19Plasma processing apparatuses having a dielectric injector
#36 | 2020-11-19Apparatuses and methods for plasma processing
#37 | 2020-08-27Methods and systems for focus ring thickness determinations and feedback control
#38 | 2020-04-30Hybrid electron beam and RF plasma system for controlled content of radicals and ions
#39 | 2020-04-30Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma
#40 | 2020-03-05Apparatus and process for electron beam mediated plasma etch and deposition processes
#41 | 2020-03-05Method and apparatus for plasma processing
#42 | 2020-02-20Systems and methods of control for plasma processing
#43 | 2020-02-20Systems and methods of control for plasma processing
#44 | 2020-02-13Ruthenium hard mask process
#45 | 2019-11-07Radical source with contained plasma
#46 | 2019-01-31SOLID-STATE SOURCE OF ATOMIC SPECIE FOR ETCHING
#47 | 2018-01-25Monolayer film mediated precision material etch
#48 | 2018-01-25Monolayer film mediated precision film deposition
#49 | 2014-10-09Pulsed gas plasma doping method and apparatus
#50 | 2014-09-18Microwave surface-wave plasma device
#51 | 2014-09-18Microwave surface-wave plasma device
#52 | 2014-05-22CAPACITIVELY COUPLED PLASMA EQUIPMENT WITH UNIFORM PLASMA DENSITY
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