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Inventor profile of:

Eisuke Morisaki

City:

Yamanashi

Country:

Japan

Published Applications:

4

Last publication date:

2016-05-26

Top Assignees for applications by Eisuke Morisaki

The entities that hold a legal rights for patent applications filed by inventor Morisaki Eisuke:

TOKYO ELECTRON LIMITED 3 Tokyo, Japan
HYOGO PREFECTURE 1 Hyogo, Japan

Recent patent applications by Morisaki Eisuke

Eisuke Morisaki from Yamanashi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2016-05-26

US20160148829A1

DEVICE AND METHOD FOR TRANSFERRING SUBSTRATE FOR FORMING COMPUND SEMICONDUCTOR FILM, AND SYSTEM AND METHOD FOR FORMING COMPUND SEMICONDUCTOR FILM

#2 | 2014-06-26

US20140174364A1

Chemistry; metallurgy

HEAT TREATMENT DEVICE

#3 | 2012-05-24

US20120128892A1

SURFACE PROCESSING METHOD AND SURFACE PROCESSING APPARATUS

#4 | 2010-04-29

US20100105213A1

Chemistry; metallurgy

Forming method of amorphous carbon film, amorphous carbon film, multilayer resist film, manufacturing method of semiconductor device, and computer-readable storage medium

InventorID:

810345 ⎘