Haifa
Israel
12
2025-12-04
The entities that hold a legal rights for patent applications filed by inventor Klein Dana:
Dana Klein from Haifa, IL has applied for patents for these inventions. The list has both pending applications and granted patents:
SYSTEM AND METHOD FOR MULTI-MERIT ADAPTIVE SAMPLING IN OVERLAY METROLOGY
#2 | 2024-03-21HIGH-RESOLUTION EVALUATION OF OPTICAL METROLOGY TARGETS FOR PROCESS CONTROL
#3 | 2023-02-16Method and System for Providing a Quality Metric for Improved Process Control
#4 | 2022-11-17Systems and methods for metrology optimization based on metrology landscapes
#5 | 2020-11-26Per-site residuals analysis for accurate metrology measurements
#6 | 2019-02-14Determining the impacts of stochastic behavior on overlay metrology data
#7 | 2018-01-25Analyzing root causes of process variation in scatterometry metrology
#8 | 2016-12-22Method and system for process control with flexible sampling
#9 | 2016-10-06Feed forward of metrology data in a metrology system
#10 | 2015-01-22Selection and use of representative target subsets
#11 | 2013-02-07Method and system for providing a quality metric for improved process control
#12 | 2012-02-02Method and system for providing process tool correctables
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