Vienna
Austria
57
2025-12-25
The entities that hold a legal rights for patent applications filed by inventor Platzgummer Elmar:
Elmar Platzgummer from Vienna, AT has applied for patents for these inventions. The list has both pending applications and granted patents:
Lithography System
#2 | 2024-12-26Determination of Imaging Transfer Function of a Charged-Particle Exposure Apparatus Using Isofocal Dose Measurements
#3 | 2023-11-09Multi-Beam Pattern Definition Device
#4 | 2023-09-21Correction of Thermal Expansion in a Lithographic Device
#5 | 2023-02-16Beam pattern device having beam absorber structure
#6 | 2022-12-01Pattern data processing for programmable direct-write apparatus
#7 | 2019-08-01Charged-particle source and method for cleaning a charged-particle source using back-sputtering
#8 | 2019-07-11Non-linear dose- and blur-dependent edge placement correction
#9 | 2019-03-21Method for irradiating a target using restricted placement grids
#10 | 2019-02-28Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus
#11 | 2018-08-02Advanced dose-level quantization of multibeam-writers
#12 | 2017-12-14Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writer
#13 | 2016-11-17Multi-beam writing using inclined exposure stripes
#14 | 2016-09-22Multi-beam writing of pattern areas of relaxed critical dimension
#15 | 2016-09-22Bi-directional double-pass multi-beam writing
#16 | 2016-03-10Correction of short-range dislocations in a multi-beam writer
#17 | 2016-01-14Compensation of imaging deviations in a particle-beam writer using a convolution kernel
#18 | 2016-01-14Customizing a particle-beam writer using a convolution kernel
#19 | 2015-12-03Compensation of dose inhomogeneity using overlapping exposure spots
#20 | 2015-10-29Multi-Beam Tool for Cutting Patterns
#21 | 2015-10-29Multi-beam tool for cutting patterns
#22 | 2015-09-03Compensation of defective beamlets in a charged-particle multi-beam exposure tool
#23 | 2015-03-12CHARGED-PARTICLE MULTI-BEAM APPARATUS HAVING CORRECTION PLATE
#24 | 2015-01-29Method for charged-particle multi-beam exposure
#25 | 2015-01-22Pattern definition device having multiple blanking arrays
#26 | 2014-07-17High-voltage insulation device for charged-particle optical apparatus
#27 | 2011-09-22Method for multi-beam exposure on a target
#28 | 2011-08-25Pattern definition device with multiple multibeam array
#29 | 2010-11-18Multi-beam deflector array means with bonded electrodes
#30 | 2010-10-28Particle-optical system
#31 | 2010-10-07Method for maskless particle-beam exposure
#32 | 2010-09-09Global point spreading function in multi-beam patterning
#33 | 2010-07-29Method for producing a multi-beam deflector array device having electrodes
#34 | 2010-05-27Method for maskless particle-beam exposure
#35 | 2010-05-20Constant current multi-beam patterning
#36 | 2010-02-18Compensation of dose inhomogeneity and image distortion
#37 | 2009-08-27Charged particle beam exposure system
#38 | 2009-08-13Particle-beam exposure apparatus with overall-modulation of a patterned beam
#39 | 2009-06-04Charged particle beam exposure system and beam manipulating arrangement
#40 | 2009-01-29Multi-beam source
#41 | 2008-11-20Pattern definition device having distinct counter-electrode array plate
#42 | 2008-10-23Charged-particle exposure apparatus
#43 | 2008-10-02Method for maskless particle-beam exposure
#44 | 2008-09-25Charged-particle exposure apparatus with electrostatic zone plate
#45 | 2008-09-04Charged particle system
#46 | 2008-08-28Multi-beam deflector array device for maskless particle-beam processing
#47 | 2008-06-26Particle-beam apparatus with improved wien-type filter
#48 | 2008-05-01Charged-particle exposure apparatus
#49 | 2007-06-07Particle-optical projection system
#50 | 2006-03-30Method of synthesising carbon nano tubes
#51 | 2006-01-24Particle multibeam lithography
#52 | 2005-11-03Advanced pattern definition for particle-beam exposure
#53 | 2005-11-03Advanced pattern definition for particle-beam processing
#54 | 2005-09-15Particle-optical projection system
#55 | 2005-05-19Charged-particle multi-beam exposure apparatus
#56 | 2005-02-22Apparatus for enhancing the lifetime of stencil masks
#57 | 2005-01-20Ion irradiation of a target at very high and very low kinetic ion energies
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