Vlad Temchenko

City:

Dresden

Country:

Germany

Published Applications:

Last publication date:

2014-07-24

Top Assignees for applications by Vlad Temchenko

The entities that hold a legal rights for patent applications filed by inventor Temchenko Vlad:

Vlad Temchenko from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Method for Exposing an Area on a Substrate to a Beam and Photolithographic System

Method for exposing an area on a substrate to a beam and photolithographic system

Reticle for use in a semiconductor lithographic system and method for modifying the same

Lithography system with illumination monitor

Optical components, illumination systems, and methods

InventorID:

844747 ⎘