Yuusuke ASANO

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2016-06-23

Top Assignees for applications by Yuusuke ASANO

The entities that hold a legal rights for patent applications filed by inventor ASANO Yuusuke:

Yuusuke ASANO from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer

Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compound

RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD

Compound, polymer, and radiation-sensitive composition

InventorID:

854269 ⎘