Aalen
Germany
18
2016-07-07
The entities that hold a legal rights for patent applications filed by inventor MUELLENDER Stephan:
Stephan MUELLENDER from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Microlithography illumination system and microlithography illumination optical unit
#2 | 2016-07-07Projection objective of a microlithographic projection exposure apparatus
#3 | 2015-11-05Reflective optical element for EUV lithography and method of manufacturing a reflective optical element
#4 | 2014-07-17Reflective optical element and optical system for EUV lithography
#5 | 2014-05-15Imaging optical system and projection exposure system including the same
#6 | 2014-01-23Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror
#7 | 2013-09-19Projection objective of a microlithographic projection exposure apparatus designed for EUV and a method of optically adjusting a projection objective
#8 | 2013-06-13Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
#9 | 2013-02-14Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective
#10 | 2011-09-15Method for producing a multilayer coating, optical element and optical arrangement
#11 | 2011-05-26Microlithography illumination system and microlithography illumination optical unit
#12 | 2010-10-21Imaging optical system and projection exposure system including the same
#13 | 2010-06-17Projection objective and method for its manufacture
#14 | 2010-03-18Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element
#15 | 2009-09-17Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
#16 | 2009-01-15PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE
#17 | 2008-12-25Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements
#18 | 2005-06-23Projection objective and method for its manufacture
87190 ⎘