Hans-Peter Moll

Semiconductor device including a leveling dielectric fill material

Semiconductor devices and manufacturing techniques for reduced aspect ratio of neighboring gate electrode lines

FDSOI-capacitor

TRENCH BASED CHARGE PUMP DEVICE

Test structures and method of forming an according test structure

Detection of gate-to-source/drain shorts

ELECTRICAL GATE-TO-SOURCE/DRAIN CONNECTION

E-fuse in SOI configuration

Method of manufacturing P-channel FET device with SiGe channel

Integrated circuit product with bulk and SOI semiconductor devices

Semiconductor device with thin-film resistor

Fully depleted device with buried insulating layer in channel region

METHODS OF FORMING A MASKING PATTERN AND A SEMICONDUCTOR DEVICE STRUCTURE

Semiconductor structure including at least one electrically conductive pillar, semiconductor structure including a contact contacting an outer layer of an electrically conductive structure and method for the formation thereof

Compact FDSOI device with Bulex contact extending through buried insulating layer adjacent gate structure for back-bias

FDSOI—capacitor

Cointegration of bulk and SOI semiconductor devices

FD devices in advanced semiconductor techniques

Embedded capacitor

INTEGRATED CIRCUITS WITH VERTICAL JUNCTIONS BETWEEN nFETS AND pFETS, AND METHODS OF MANUFACTURING THE SAME

Integrated circuits with protected resistors and methods for fabricating the same

Top corner rounding by implant-enhanced wet etching

Methods of forming asymmetric spacers on various structures on integrated circuit products

Single-Sided Trench Contact Window

Interconnect structure for semiconductor devices

INTEGRATED DEVICE

Method of forming a semiconductor device

Method for producing a trench transistor and trench transistor

METHOD FOR PRODUCING A STRUCTURE WITH A LOW ASPECT RATIO

Method for fabricating a self-aligning mask

Process for producing an etching mask on a microstructure, in particular a semiconductor structure with trench capacitors, and corresponding use of the etching mask

Method for fabricating a semiconductor structure

Method for masking a recess in a structure having a high aspect ratio

Semiconductor substrate with trenches of varying depth

Method for fabricating an integrated semiconductor component

Method for fabricating a trench capacitor with an insulation collar

Method for fabricating a hole trench storage capacitor in a semiconductor substrate, and hole trench storage capacitor