Santa Clara, California
United States
29
2020-12-17
The entities that hold a legal rights for patent applications filed by inventor Schmiege Benjamin:
Benjamin Schmiege from Santa Clara, US has applied for patents for these inventions. The list has both pending applications and granted patents:
METHODS AND APPARATUS FOR DEPOSITING YTTRIUM-CONTAINING FILMS
#2 | 2020-05-14Ruthenium precursors for ALD and CVD thin film deposition and uses thereof
#3 | 2019-12-19Methods of forming self-aligned vias
#4 | 2019-03-14Selective deposition defects removal by chemical etch
#5 | 2019-02-28Lanthanide, Yttrium and Scandium precursors for ALD, CVD and Thin Film Doping and Methods of Use
#6 | 2019-01-17Methods and apparatus for depositing yttrium-containing films
#7 | 2019-01-10Methods of forming self-aligned vias
#8 | 2018-12-20In-situ formation of non-volatile lanthanide thin film precursors and use in ALD and CVD
#9 | 2018-11-29Selective dry etching of metal films comprising multiple metal oxides
#10 | 2018-09-20System and method for controllable non-volatile metal removal
#11 | 2018-07-12Methods of etching films with reduced surface roughness
#12 | 2018-06-07Ruthenium precursors for ALD and CVD thin film deposition and uses thereof
#13 | 2018-05-31Precursors for deposition of metal, metal nitride and metal oxide based films of transition metals
#14 | 2018-04-05Methods of forming self-aligned vias
#15 | 2018-02-08Methods of etching films comprising transition metals
#16 | 2017-12-14Lanthanide, Yttrium And Scandium Precursors For ALD, CVD And Thin Film Doping And Methods Of Use
#17 | 2017-06-08System and method for controllable non-volatile metal removal
#18 | 2017-04-06Methods of etching films with reduced surface roughness
#19 | 2016-12-22Deposition methods for uniform and conformal hybrid titanium oxide films
#20 | 2016-10-06Methods of etching films comprising transition metals
#21 | 2016-09-20Selectively etching metals and metal nitrides conformally
#22 | 2016-09-15System and method for controllable non-volatile metal removal
#23 | 2016-08-04Oxide and metal removal
#24 | 2016-02-04Methods of etching films with reduced surface roughness
#25 | 2015-12-03Oxide and metal removal
#26 | 2015-07-09Film deposition using spatial atomic layer deposition or pulsed chemical vapor deposition
#27 | 2014-11-06Cobalt removal for chamber clean or pre-clean process
#28 | 2014-09-18Methods of etching films comprising transition metals
#29 | 2014-09-11Methods for depositing films comprising cobalt and cobalt nitrides
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