Jon C. FARR

City:

Vallejo, California

Country:

United States

Published Applications:

Last publication date:

2014-09-11

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Jon C. FARR from Vallejo, US has applied for patents for these inventions. The list has both pending applications and granted patents:

Method and apparatus for high efficiency gas dissociation in inductive coupled plasma reactor

METHOD OF FILLING A DEEP TRENCH IN A SUBSTRATE

Method of forming a deep trench in a substrate

Method and apparatus for high efficiency gas dissociation in inductive couple plasma reactor

InventorID:

904488 ⎘