Hirokazu UEDA

City:

Sendai

Country:

Japan

Published Applications:

Last publication date:

2014-10-09

Top Assignees for applications by Hirokazu UEDA

The entities that hold a legal rights for patent applications filed by inventor UEDA Hirokazu:

Hirokazu UEDA from Sendai, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Pulsed gas plasma doping method and apparatus

Method for fabricating semiconductor device and the semiconductor device

Film forming method of silicon oxide film, silicon oxide film, semiconductor device, and manufacturing method of semiconductor device

InventorID:

930216 ⎘