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Inventor profile of:

James Tsung

City:

Milpitas, California

Country:

United States

Published Applications:

30

Last publication date:

2015-07-02

Top Assignees for applications by James Tsung

The entities that hold a legal rights for patent applications filed by inventor Tsung James:

Recent patent applications by Tsung James

James Tsung from Milpitas, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2015-07-02
US20150184287A1
Chemistry; metallurgy

Systems and Methods for Parallel Combinatorial Vapor Deposition Processing

 #2 | 2015-06-25
US20150179487A1
Electricity

Multipurpose combinatorial vapor phase deposition chamber

 #3 | 2015-06-25
US20150176117A1
Chemistry; metallurgy

Interchangeable sputter gun head

 #4 | 2015-06-18
US20150170908A1
Electricity

High productivity combinatorial processing using pressure-controlled one-way valves

 #5 | 2015-04-02
US20150093898A1
Electricity

Combinatorial Process System

 #6 | 2014-10-30
US20140318450A1
Chemistry; metallurgy

Method and System for Isolated and Discretized Process Sequence Integration

 #7 | 2014-10-23
US20140311408A1
Chemistry; metallurgy

Multi-Region Processing System and Heads

 #8 | 2014-09-18
US20140273309A1
Electricity

Controlling Radical Lifetimes in a Remote Plasma Chamber

 #9 | 2014-07-03
US20140183161A1
Chemistry; metallurgy

Methods and Systems for Site-Isolated Combinatorial Substrate Processing Using a Mask

 #10 | 2014-06-26
US20140174907A1
Chemistry; metallurgy

High Deposition Rate Chamber with Co-Sputtering Capabilities

 #11 | 2014-06-19
US20140166840A1
Electricity

Substrate Carrier

 #12 | 2013-07-16
US13489312
-

Method and apparatus for variable conductance

 #13 | 2013-07-04
US20130168231A1
Electricity

Method For Sputter Deposition And RF Plasma Sputter Etch Combinatorial Processing

 #14 | 2013-06-20
US20130153149A1
Chemistry; metallurgy

Substrate Processing Tool with Tunable Fluid Flow

 #15 | 2013-06-13
US20130149469A1
Chemistry; metallurgy

Combinatorial RF bias method for PVD

 #16 | 2013-02-21
US20130042810A1
Electricity

Method and system for mask handling in high productivity chamber

 #17 | 2012-12-20
US20120322173A1
Chemistry; metallurgy

Method and system for isolated and discretized process sequence integration

 #18 | 2012-07-10
US12354679
-

Method and apparatus for variable conductance

 #19 | 2012-06-14
US20120149180A1
Electricity

Combinatorial process system

 #20 | 2012-06-07
US20120142197A1
Electricity

Combinatorial process system

 #21 | 2011-10-27
US20110262644A1
Electricity

Method and system for mask handling in high productivity chamber

 #22 | 2011-09-01
US20110209663A1
Chemistry; metallurgy

Multi-region processing system

 #23 | 2011-03-17
US20110065284A1
Chemistry; metallurgy

Method and system for isolated and discretized process sequence integration

 #24 | 2009-03-12
US20090069924A1
Electricity

Combinatorial process system

 #25 | 2009-03-12
US20090068849A1
Chemistry; metallurgy

Multi-region processing system and heads

 #26 | 2009-03-05
US20090061108A1
Electricity

Combinatorial process system

 #27 | 2009-03-05
US20090061087A1
Electricity

Combinatorial process system

 #28 | 2008-12-04
US20080295962A1
Electricity

Method and system for mask handling in high productivity chamber

 #29 | 2008-01-24
US20080020589A1
Chemistry; metallurgy

Method and system for isolated and discretized process sequence integration

 #30 | 2008-01-24
US20080017109A1
Chemistry; metallurgy

Method and system for isolated and discretized process sequence integration
InventorID:

95774 ⎘