Altheim
Germany
17
2017-06-22
The entities that hold a legal rights for patent applications filed by inventor Kneer Bernhard:
Bernhard Kneer from Altheim, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Lithographic apparatus and method
#2 | 2017-03-23Microlithographic projection exposure apparatus and measuring device for a projection lens
#3 | 2016-03-03Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
#4 | 2013-05-16Exposure apparatus and measuring device for a projection lens
#5 | 2013-02-21Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
#6 | 2011-09-22PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#7 | 2010-06-10Exposure apparatus and measuring device for a projection lens
#8 | 2009-04-21Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned components
#9 | 2008-12-18MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
#10 | 2008-12-11PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#11 | 2008-11-13Method for distortion correction in a microlithographic projection exposure apparatus
#12 | 2008-05-13Method for distortion correction in a microlithographic projection exposure apparatus
#13 | 2007-12-13Imaging system for a microlithographical projection light system
#14 | 2007-07-26Projection exposure system
#15 | 2007-07-19Projection objective for a microlithographic projection exposure apparatus
#16 | 2007-03-29MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
#17 | 2006-08-03Projection exposure system
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