Assignee profile:

MacDermid Enthone Inc.

City:

Waterbury, Connecticut

Country:

United States

Published Applications:

40

Last publication date:

2025-06-26

Patent Grants:

39

Last grant date:

2026-02-03

Top Inventors for applications by MacDermid Enthone Inc.

These are the the leading inventors for applications assigned to MacDermid Enthone Inc.:

Recent patent applications by MacDermid Enthone Inc.

MacDermid Enthone Inc. based in Waterbury, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2025-06-26 βœ… Patent 12,540,404 granted on 2026-02-03
US20250207264A1
Chemistry; metallurgy

METHOD FOR IMPROVING ADHESION BETWEEN METALLIZATION LAYERS AND OZONE-ETCHED PLASTICS

#2 | 2025-04-03 βœ… Patent 12,553,134 granted on 2026-02-17
US20250109499A1
Chemistry; metallurgy

Bendable Nickel Plating on Flexible Substrates

#3 | 2024-08-15 βœ… Patent 12,325,927 granted on 2025-06-10
US20240271307A1
Chemistry; metallurgy

COMPLEX WAVEFORM FOR ELECTROLYTIC PLATING

#4 | 2024-07-04 βœ… Patent 12,635,082 granted on 2026-05-19
US20240224432A1
Electricity

Single Step Electrolytic Method of Filling Through-Holes in Printed Circuit Boards and Other Substrates

#5 | 2023-12-21 βœ… Patent 12,157,944 granted on 2024-12-03
US20230407467A1
Chemistry; metallurgy

Method and wet chemical compositions for diffusion barrier formation

#6 | 2022-09-22 βœ… Patent 11,873,568 granted on 2024-01-16
US20220298665A1
Chemistry; metallurgy

Compositions and methods for the electrodeposition of nanotwinned copper

#7 | 2022-08-18 βœ… Patent 11,846,018 granted on 2023-12-19
US20220259724A1
Chemistry; metallurgy

Method and wet chemical compositions for diffusion barrier formation

#8 | 2022-06-02 βœ… Patent 11,643,742 granted on 2023-05-09
US20220170172A1
Chemistry; metallurgy

Silver/tin electroplating bath and method of using the same

#9 | 2022-05-05 βœ… Patent 11,807,951 granted on 2023-11-07
US20220136123A1
Chemistry; metallurgy

Cobalt chemistry for smooth topology

#10 | 2022-03-03 βœ… Patent 11,384,446 granted on 2022-07-12
US20220064812A1
Chemistry; metallurgy

Compositions and methods for the electrodeposition of nanotwinned copper

#11 | 2022-03-03 βœ… Patent 12,270,121 granted on 2025-04-08
US20220064811A1
Chemistry; metallurgy

Composition and method for fabrication of nickel interconnects

#12 | 2021-12-16 βœ… Patent 11,697,884 granted on 2023-07-11
US20210388519A1
Chemistry; metallurgy

Copper deposition in wafer level packaging of integrated circuits

#13 | 2021-12-09 βœ… Patent 11,280,014 granted on 2022-03-22
US20210381121A1
Chemistry; metallurgy

Silver/tin electroplating bath and method of using the same

#14 | 2021-10-28 βœ… Patent 11,401,618 granted on 2022-08-02
US20210332491A1
Chemistry; metallurgy

Cobalt filling of interconnects

#15 | 2021-10-07 βœ… Patent 12,398,480 granted on 2025-08-26
US20210310141A1
Chemistry; metallurgy

Leveler Compositions for use in Copper Deposition in Manufacture of Microelectronics

#16 | 2021-07-22 βœ… Patent 11,434,578 granted on 2022-09-06
US20210222314A1
Chemistry; metallurgy

Cobalt filling of interconnects in microelectronics

#17 | 2021-06-17 βœ… Patent 11,230,778 granted on 2022-01-25
US20210180200A1
Chemistry; metallurgy

Cobalt chemistry for smooth topology

#18 | 2021-05-06 βœ… Patent 11,746,433 granted on 2023-09-05
US20210130970A1
Chemistry; metallurgy

Single step electrolytic method of filling through holes in printed circuit boards and other substrates

#19 | 2020-05-28 βœ… Patent 11,015,255 granted on 2021-05-25
US20200165739A1
Chemistry; metallurgy

Selective plating of three dimensional surfaces to produce decorative and functional effects

#20 | 2020-05-07 βœ… Patent 10,988,854 granted on 2021-04-27
US20200141022A1
Chemistry; metallurgy

Flexible color adjustment for dark Cr(III) platings

#21 | 2020-02-27 βœ… Patent 11,168,406 granted on 2021-11-09
US20200063280A1
Chemistry; metallurgy

Leveler compositions for use in copper deposition in manufacture of microelectronics

#22 | 2020-02-06 βœ… Patent 10,995,417 granted on 2021-05-04
US20200040478A1
Chemistry; metallurgy

Cobalt filling of interconnects in microelectronics

#23 | 2019-12-05 βœ… Patent 11,124,888 granted on 2021-09-21
US20190368064A1
Chemistry; metallurgy

Copper deposition in wafer level packaging of integrated circuits

#24 | 2019-11-14 βœ… Patent 10,986,738 granted on 2021-04-20
US20190350089A1
Electricity

Carbon-based direct plating process

#25 | 2019-11-14 βœ… Patent 10,941,496 granted on 2021-03-09
US20190345617A1
Chemistry; metallurgy

Near neutral pH pickle on multi-metals

#26 | 2019-10-15 βœ… Patent 10,443,135 granted on 2019-10-15
US15977526
Chemistry; metallurgy

Near neutral pH pickle on multi-metals

#27 | 2019-06-13 βœ… Patent 10,508,207 granted on 2019-12-17
US20190177556A9
Chemistry; metallurgy

Compositions including a high molecular weight acid suitable for conductive polymer formation on dielectric substrate

#28 | 2019-03-28 βœ… Patent 10,828,668 granted on 2020-11-10
US20190091724A1
Performing operations; transporting

Textured hardcoat films

#29 | 2019-03-21
US20190085461A1
Chemistry; metallurgy

WATER SOLUBLE AND AIR STABLE PHOSPHAADAMANTANES AS STABILIZERS FOR ELECTROLESS METAL DEPOSITION

#30 | 2019-01-10 βœ… Patent 11,035,048 granted on 2021-06-15
US20190010624A1
Chemistry; metallurgy

Cobalt filling of interconnects

#31 | 2019-01-03 βœ… Patent 10,221,496 granted on 2019-03-05
US20190003068A9
Chemistry; metallurgy

Copper filling of through silicon vias

#32 | 2018-12-06 βœ… Patent 10,774,425 granted on 2020-09-15
US20180347038A1
Chemistry; metallurgy

Elimination of H2S in immersion tin plating solution

#33 | 2018-09-20 βœ… Patent 10,544,516 granted on 2020-01-28
US20180266008A1
Chemistry; metallurgy

Flexible color adjustment for dark Cr(III) platings

#34 | 2018-01-04 βœ… Patent 10,508,207 granted on 2019-12-17
US20180002541A1
Chemistry; metallurgy

Compositions including a high molecular weight acid suitable for conductive polymer formation on dielectric substrate

#35 | 2017-08-17 βœ… Patent 10,519,557 granted on 2019-12-31
US20170233883A1
Chemistry; metallurgy

Leveler compositions for use in copper deposition in manufacture of microelectronics

#36 | 2016-09-01 βœ… Patent 10,103,029 granted on 2018-10-16
US20160254156A1
Electricity

Process for filling vias in the microelectronics

#37 | 2016-08-04 βœ… Patent 10,081,876 granted on 2018-09-25
US20160222534A1
Chemistry; metallurgy

Aqueous electrolyte composition having a reduced airborne emission, method and use of this composition

#38 | 2016-03-17 βœ… Patent 10,294,574 granted on 2019-05-21
US20160076160A1
Chemistry; metallurgy

Levelers for copper deposition in microelectronics

#39 | 2014-05-01 βœ… Patent 10,541,140 granted on 2020-01-21
US20140120722A1
Electricity

Process for filling vias in the microelectronics

#40 | 2013-08-08 βœ… Patent 10,221,496 granted on 2019-03-05
US20130199935A1
Chemistry; metallurgy

COPPER FILLING OF THROUGH SILICON VIAS

Also check out MacDermid Enthone Inc.'s (Waterbury, United States) applicant profile with 46 patent applications submitted.

AssigneeID:

146592 ⎘