Inventor profile of:

Vincent Paneccasio

City:

Madison, Connecticut

Country:

United States

Published Applications:

18

Last publication date:

2025-07-31

Top Assignees for applications by Vincent Paneccasio

The entities that hold a legal rights for patent applications filed by inventor Paneccasio Vincent:

Recent patent applications by Paneccasio Vincent

Vincent Paneccasio from Madison, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-07-31
US20250243596A1
Chemistry; metallurgy

Composition and Method for Fabrication of Nickel Interconnects

#2 | 2016-09-01
US20160254156A1
Electricity

Process for filling vias in the microelectronics

#3 | 2010-11-11
US20100285660A1
Electricity

Copper deposition for filling features in manufacture of microelectronic devices

#4 | 2008-10-02
US20080236619A1
Chemistry; metallurgy

COBALT CAPPING SURFACE PREPARATION IN MICROELECTRONICS MANUFACTURE

#5 | 2008-05-29
US20080121527A1
Chemistry; metallurgy

Defect reduction in electrodeposited copper for semiconductor applications

#6 | 2008-04-17
US20080090414A1
Chemistry; metallurgy

Manufacture of electroless cobalt deposition compositions for microelectronics applications

#7 | 2008-01-08
US10091106
-

Defect reduction in electrodeposited copper for semiconductor applications

#8 | 2007-12-20
US20070289875A1
Electricity

Copper electrodeposition in microelectronics

#9 | 2007-08-02
US20070178697A1
Electricity

Copper electrodeposition in microelectronics

#10 | 2007-03-22
US20070066059A1
Chemistry; metallurgy

Defectivity and process control of electroless deposition in microelectronics applications

#11 | 2007-03-22
US20070066058A1
Chemistry; metallurgy

Defectivity and process control of electroless deposition in microelectronics applications

#12 | 2007-03-22
US20070066057A1
Chemistry; metallurgy

Defectivity and process control of electroless deposition in microelectronics applications

#13 | 2007-03-22
US20070062408A1
Chemistry; metallurgy

Defectivity and process control of electroless deposition in microelectronics applications

#14 | 2006-12-14
US20060280860A1
Chemistry; metallurgy

Cobalt electroless plating in microelectronic devices

#15 | 2006-06-29
US20060141784A1
Electricity

Copper electrodeposition in microelectronics

#16 | 2006-04-20
US20060083850A1
Electricity

Cobalt and nickel electroless plating in microelectronic devices

#17 | 2005-12-08
US20050268991A1
Chemistry; metallurgy

Corrosion resistance enhancement of tin surfaces

#18 | 2005-03-03
US20050045488A1
Chemistry; metallurgy

Copper electrodeposition in microelectronics

InventorID:

1639305 ⎘