Assignee profile:

ASML Netherlands B.V.

City:

DR Veldhoven

Country:

Netherlands

Published Applications:

15

Last publication date:

2012-08-23

Patent Grants:

13

Last grant date:

2014-05-27

Top Inventors for applications by ASML Netherlands B.V.

These are the the leading inventors for applications assigned to ASML Netherlands B.V.:

Recent patent applications by ASML Netherlands B.V.

ASML Netherlands B.V. based in DR Veldhoven, NL has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2012-08-23 ✅ Patent 8,739,082 granted on 2014-05-27
US20120216156A1
Physics

Method of pattern selection for source and mask optimization

#2 | 2011-05-05
US20110102774A1
Physics

Focus Sensor, Inspection Apparatus, Lithographic Apparatus and Control System

#3 | 2011-01-20 ✅ Patent 8,068,212 granted on 2011-11-29
US20110013163A1
Physics

Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements

#4 | 2006-10-19 ✅ Patent 7,218,380 granted on 2007-05-15
US20060232758A1
Physics

Lithographic apparatus and device manufacturing method

#5 | 2006-10-12 ✅ Patent 7,283,249 granted on 2007-10-16
US20060227332A1
Physics

Lithographic apparatus and a method of calibrating such an apparatus

#6 | 2006-10-12 ✅ Patent 7,436,485 granted on 2008-10-14
US20060227307A1
Physics

Lithographic apparatus, patterning assembly and contamination estimation method

#7 | 2006-06-22 ✅ Patent 7,136,149 granted on 2006-11-14
US20060132743A1
Physics

Lithographic apparatus with autofocus system

#8 | 2006-05-18 ✅ Patent 7,327,439 granted on 2008-02-05
US20060102277A1
Physics

Lithographic apparatus and device manufacturing method

#9 | 2006-05-04 ✅ Patent 7,274,432 granted on 2007-09-25
US20060091327A1
Physics

Radiation system, lithographic apparatus, device manufacturing method, and device manufactured thereby

#10 | 2006-02-16 ✅ Patent 7,791,727 granted on 2010-09-07
US20060033921A1
Physics

Method and apparatus for angular-resolved spectroscopic lithography characterization

#11 | 2006-01-26 ✅ Patent 7,161,663 granted on 2007-01-09
US20060017893A1
Physics

Lithographic apparatus

#12 | 2005-11-24 ✅ Patent 7,315,032 granted on 2008-01-01
US20050260779A1
Physics

Lithographic apparatus and a device manufacturing method

#13 | 2005-11-24 ✅ Patent 7,616,383 granted on 2009-11-10
US20050259232A1
Physics

Lithographic apparatus and device manufacturing method

#14 | 2005-01-27 ✅ Patent 7,253,884 granted on 2007-08-07
US20050018159A1
Physics

Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method

#15 | 2005-01-06
US20050002003A1
Physics

Lithographic apparatus and device manufacturing method

Also check out ASML Netherlands B.V.'s (DR Veldhoven, Netherlands) applicant profile with 1 patent applications submitted.

AssigneeID:

188892 ⎘