Inventor profile of:

Emiel Jozef Melanie Eussen

City:

Eindhoven

Country:

Netherlands

Published Applications:

28

Last publication date:

2018-12-20

Top Assignees for applications by Emiel Jozef Melanie Eussen

The entities that hold a legal rights for patent applications filed by inventor Eussen Emiel Jozef Melanie:

Recent patent applications by Eussen Emiel Jozef Melanie

Emiel Jozef Melanie Eussen from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2018-12-20
US20180364594A1
Physics

Position measurement system and lithographic apparatus

#2 | 2016-08-04
US20160223917A1
Physics

Stage apparatus, lithographic apparatus and method of positioning an object table

#3 | 2016-04-21
US20160109812A1
Physics

Lithographic apparatus

#4 | 2014-01-23
US20140022527A1
Physics

Lithographic apparatus

#5 | 2013-02-28
US20130050670A1
Electricity

Position measurement system, lithographic apparatus and device manufacturing method

#6 | 2012-09-27
US20120242969A1
Physics

Lithographic apparatus

#7 | 2012-03-01
US20120050709A1
Physics

Stage apparatus, lithographic apparatus and method of positioning an object table

#8 | 2011-08-25
US20110208459A1
Physics

Lithographic apparatus and method for correcting a position of a stage of a lithographic apparatus

#9 | 2011-05-19
US20110116066A1
Physics

Lithographic apparatus and device manufacturing method

#10 | 2010-10-28
US20100271611A1
Physics

Lithographic apparatus having a substrate support with open cell plastic foam parts

#11 | 2010-01-14
US20100007867A1
Physics

Lithographic apparatus and calibration method

#12 | 2009-11-12
US20090279067A1
Physics

Stage system and lithographic apparatus comprising such stage system

#13 | 2009-09-24
US20090237634A1
Physics

Encoder-type measurement system, lithographic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system

#14 | 2009-05-21
US20090128791A1
Physics

Stage system, lithographic apparatus including such stage system, and correction method

#15 | 2008-12-25
US20080319569A1
Physics

Lithographic projection apparatus and method for controlling a support structure

#16 | 2008-11-27
US20080291413A1
Physics

Lithographic apparatus having an encoder position sensor system

#17 | 2008-11-13
US20080278702A1
Physics

Lithographic apparatus and sensor calibration method

#18 | 2008-05-08
US20080105026A1
Physics

Lithographic apparatus and device manufacturing method

#19 | 2007-08-23
US20070195296A1
Physics

Lithographic apparatus and device manufacturing method

#20 | 2007-06-28
US20070146661A1
Physics

Lithographic apparatus, and apparatus and method for measuring an object position in a medium

#21 | 2007-06-14
US20070132980A1
Physics

Lithographic apparatus and device manufacturing method

#22 | 2007-04-05
US20070076218A1
Physics

Lithographic apparatus temperature compensation

#23 | 2007-03-29
US20070070313A1
Physics

Lithographic apparatus and device manufacturing method

#24 | 2007-03-08
US20070052976A1
Physics

Position measurement system and lithographic apparatus

#25 | 2007-03-08
US20070051160A1
Physics

Position measurement system and lithographic apparatus

#26 | 2006-10-12
US20060227332A1
Physics

Lithographic apparatus and a method of calibrating such an apparatus

#27 | 2006-06-29
US20060139586A1
Physics

Lithographic apparatus and device manufacturing method

#28 | 2005-11-10
US20050248771A1
Physics

Lithographic interferometer system with an absolute measurement subsystem and differential measurement subsystem and method thereof

InventorID:

110920 ⎘