Campbell, California
United States
29
2021-07-08
The entities that hold a legal rights for patent applications filed by inventor Dusa Mircea:
Mircea Dusa from Campbell, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method and apparatus for angular-resolved spectroscopic lithography characterization
#2 | 2019-06-06Method and apparatus for angular-resolved spectroscopic lithography characterization
#3 | 2015-12-17Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers
#4 | 2014-08-21Method and apparatus for angular-resolved spectroscopic lithography characterization
#5 | 2014-07-10Alignment target contrast in a lithographic double patterning process
#6 | 2014-02-27Method and apparatus for angular-resolved spectroscopic lithography characterization
#7 | 2012-02-16Method and apparatus for angular-resolved spectroscopic lithography characterization
#8 | 2011-01-13Method and apparatus for angular-resolved spectroscopic lithography characterization
#9 | 2010-12-02Improving alignment target contrast in a lithographic double patterning process
#10 | 2010-06-24Optimization method and a lithographic cell
#11 | 2009-03-19MARKER STRUCTURE, MASK PATTERN, ALIGNMENT METHOD, AND LITHOGRAPHIC METHOD AND APPARATUS
#12 | 2008-11-13Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#13 | 2008-06-26Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing method
#14 | 2008-03-13Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing method
#15 | 2008-02-21Method and apparatus for angular-resolved spectroscopic lithography characterization
#16 | 2008-01-24Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#17 | 2007-12-27Characterization of transmission losses in an optical system
#18 | 2007-08-09Lithographic system, sensor, and method of measuring properties of a substrate
#19 | 2007-03-08Test pattern, inspection method, and device manufacturing method
#20 | 2007-01-04Focus determination method, device manufacturing method, and mask
#21 | 2006-12-19Test pattern, inspection method, and device manufacturing method
#22 | 2006-12-12Test pattern, inspection method, and device manufacturing method
#23 | 2006-11-16Inspection apparatus and method of inspection
#24 | 2006-09-26Device inspection method and apparatus using an asymmetric marker
#25 | 2006-06-29Latent overlay metrology
#26 | 2006-05-25Latent overlay metrology
#27 | 2006-03-30Method and apparatus for angular-resolved spectroscopic lithography characterization
#28 | 2006-02-16Method and apparatus for angular-resolved spectroscopic lithography characterization
#29 | 2005-02-10Marker structure, mask pattern, alignment method and lithographic method and apparatus
664342 ⎘