Santa Clara, California
United States
63
2009-08-06
60
2010-11-09
These are the the leading inventors for applications assigned to Timbre Technologies, Inc.:
Timbre Technologies, Inc. based in Santa Clara, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Optical metrology of structures formed on semiconductor wafers using machine learning systems
#2 | 2009-04-09 ✅ Patent 8,170,833 granted on 2012-05-01Transforming metrology data from a semiconductor treatment system using multivariate analysis
#3 | 2008-11-20 ✅ Patent 7,616,325 granted on 2009-11-10Optical metrology optimization for repetitive structures
#4 | 2008-10-23 ✅ Patent 7,586,623 granted on 2009-09-08Optical metrology of single features
#5 | 2008-10-09 ✅ Patent 7,593,119 granted on 2009-09-22Generation of a library of periodic grating diffraction signals
#6 | 2008-09-23 ✅ Patent 7,427,521 granted on 2008-09-23Generating simulated diffraction signals for two-dimensional structures
#7 | 2008-08-14OPTICAL METROLOGY MODEL OPTIMIZATION FOR REPETITIVE STRUCTURES
#8 | 2008-06-26 ✅ Patent 7,505,153 granted on 2009-03-17Model and parameter selection for optical metrology
#9 | 2008-03-20 ✅ Patent 7,617,075 granted on 2009-11-10Library accuracy enhancment and evaluation
#10 | 2008-02-14 ✅ Patent 7,450,232 granted on 2008-11-11Generic interface for an optical metrology system
#11 | 2008-02-12 ✅ Patent 7,330,279 granted on 2008-02-12Model and parameter selection for optical metrology
#12 | 2008-02-07 ✅ Patent 7,453,584 granted on 2008-11-18Examining a structure formed on a semiconductor wafer using machine learning systems
#13 | 2007-10-25 ✅ Patent 7,444,196 granted on 2008-10-28Optimized characterization of wafers structures for optical metrology
#14 | 2007-10-11 ✅ Patent 7,414,733 granted on 2008-08-19Azimuthal scanning of a structure formed on a semiconductor wafer
#15 | 2007-10-04 ✅ Patent 7,474,420 granted on 2009-01-06In-die optical metrology
#16 | 2007-10-04 ✅ Patent 7,522,293 granted on 2009-04-21Optical metrology of multiple patterned layers
#17 | 2007-09-27 ✅ Patent 7,302,367 granted on 2007-11-27Library accuracy enhancement and evaluation
#18 | 2007-09-27 ✅ Patent 7,395,132 granted on 2008-07-01Optical metrology model optimization for process control
#19 | 2007-09-27 ✅ Patent 7,428,060 granted on 2008-09-23Optimization of diffraction order selection for two-dimensional structures
#20 | 2007-09-25 ✅ Patent 7,274,472 granted on 2007-09-25Resolution enhanced optical metrology
#21 | 2007-09-13 ✅ Patent 7,523,021 granted on 2009-04-21Weighting function to enhance measured diffraction signals in optical metrology
#22 | 2007-08-23 ✅ Patent 7,474,993 granted on 2009-01-06Selection of wavelengths for integrated circuit optical metrology
#23 | 2007-08-09 ✅ Patent 7,467,064 granted on 2008-12-16Transforming metrology data from a semiconductor treatment system using multivariate analysis
#24 | 2007-06-14 ✅ Patent 7,588,949 granted on 2009-09-15Optical metrology model optimization based on goals
#25 | 2007-05-08 ✅ Patent 7,216,045 granted on 2007-05-08Selection of wavelengths for integrated circuit optical metrology
#26 | 2007-01-04 ✅ Patent 7,515,282 granted on 2009-04-07Modeling and measuring structures with spatially varying properties in optical metrology
#27 | 2006-12-28 ✅ Patent 7,355,728 granted on 2008-04-08Optical metrology model optimization for repetitive structures
#28 | 2006-11-14 ✅ Patent 7,136,796 granted on 2006-11-14Generation and use of integrated circuit profile-based simulation information
#29 | 2006-11-02 ✅ Patent 7,271,902 granted on 2007-09-18Generic interface for an optical metrology system
#30 | 2006-10-05 ✅ Patent 7,421,414 granted on 2008-09-02Split machine learning systems
#31 | 2006-08-24 ✅ Patent 7,379,192 granted on 2008-05-27Optical metrology of single features
#32 | 2006-08-24Selecting unit cell configuration for repeating structures in optical metrology
#33 | 2006-08-17 ✅ Patent 7,274,465 granted on 2007-09-25Optical metrology of a structure formed on a semiconductor wafer using optical pulses
#34 | 2006-08-15 ✅ Patent 7,092,110 granted on 2006-08-15Optimized model and parameter selection for optical metrology
#35 | 2006-07-04 ✅ Patent 7,072,049 granted on 2006-07-04Model optimization for structures with additional materials
#36 | 2006-06-20 ✅ Patent 7,064,829 granted on 2006-06-20Generic interface for an optical metrology system
#37 | 2006-06-08 ✅ Patent 7,280,229 granted on 2007-10-09Examining a structure formed on a semiconductor wafer using machine learning systems
#38 | 2006-05-16 ✅ Patent 7,046,375 granted on 2006-05-16Edge roughness measurement in optical metrology
#39 | 2006-05-09 ✅ Patent 7,041,515 granted on 2006-05-09Balancing planarization of layers and the effect of underlying structure on the metrology signal
#40 | 2006-04-18 ✅ Patent 7,030,999 granted on 2006-04-18Optical metrology of single features
#41 | 2006-04-18 ✅ Patent 7,031,894 granted on 2006-04-18Generating a library of simulated-diffraction signals and hypothetical profiles of periodic gratings
#42 | 2006-03-23 ✅ Patent 7,171,284 granted on 2007-01-30Optical metrology model optimization based on goals
#43 | 2006-03-02 ✅ Patent 7,566,181 granted on 2009-07-28Controlling critical dimensions of structures formed on a wafer in semiconductor processing
#44 | 2006-01-12 ✅ Patent 7,065,423 granted on 2006-06-20Optical metrology model optimization for process control
#45 | 2005-12-15Shape roughness measurement in optical metrology
#46 | 2005-11-17 ✅ Patent 7,277,189 granted on 2007-10-02Generation of a library of periodic grating diffraction signals
#47 | 2005-11-01 ✅ Patent 6,961,679 granted on 2005-11-01Method and system of dynamic learning through a regression-based library generation process
#48 | 2005-09-22 ✅ Patent 7,388,677 granted on 2008-06-17Optical metrology optimization for repetitive structures
#49 | 2005-09-13 ✅ Patent 6,943,900 granted on 2005-09-13Generation of a library of periodic grating diffraction signals
#50 | 2005-09-01 ✅ Patent 7,523,076 granted on 2009-04-21Selecting a profile model for use in optical metrology using a machine learning system
#51 | 2005-08-09 ✅ Patent 6,928,395 granted on 2005-08-09Method and system for dynamic learning through a regression-based library generation process
#52 | 2005-06-16 ✅ Patent 7,126,700 granted on 2006-10-24Parametric optimization of optical metrology model
#53 | 2005-05-10 ✅ Patent 6,891,626 granted on 2005-05-10Caching of intra-layer calculations for rapid rigorous coupled-wave analyses
#54 | 2005-04-28 ✅ Patent 7,224,471 granted on 2007-05-29Azimuthal scanning of a structure formed on a semiconductor wafer
#55 | 2005-03-31 ✅ Patent 6,952,271 granted on 2005-10-04Caching of intra-layer calculations for rapid rigorous coupled-wave analyses
#56 | 2005-03-17 ✅ Patent 7,394,554 granted on 2008-07-01Selecting a hypothetical profile to use in optical metrology
#57 | 2005-02-15 ✅ Patent 6,855,464 granted on 2005-02-15Grating test patterns and methods for overlay metrology
#58 | 2005-02-15 ✅ Patent 6,857,114 granted on 2005-02-15Clustering for data compression
#59 | 2005-02-10 ✅ Patent 6,947,141 granted on 2005-09-20Overlay measurements using zero-order cross polarization measurements
#60 | 2005-02-08 ✅ Patent 6,853,942 granted on 2005-02-08Metrology hardware adaptation with universal library
#61 | 2005-01-13 ✅ Patent 7,440,881 granted on 2008-10-21Adaptive correlation of pattern resist structures using optical metrology
#62 | 2005-01-11 ✅ Patent 6,842,261 granted on 2005-01-11Integrated circuit profile value determination
#63 | 2005-01-04 ✅ Patent 6,839,145 granted on 2005-01-04Optical profilometry of additional-material deviations in a periodic grating
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