Inventor profile of:

Yan CHEN

City:

Santa Clara, California

Country:

United States

Published Applications:

15

Last publication date:

2025-04-17

Top Assignees for applications by Yan CHEN

The entities that hold a legal rights for patent applications filed by inventor CHEN Yan:

Recent patent applications by CHEN Yan

Yan CHEN from Santa Clara, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-04-17
US20250123291A1
Physics

APPLICATION OF HIGH MANNOSE GLYCAN BINDING PROTEINS AND COMPLEX GLYCAN BINDING PROTEINS

#2 | 2017-11-02
US20170314991A1
Physics

Spatially resolved optical emission spectroscopy (OES) in plasma processing

#3 | 2015-05-07
US20150124250A1
Physics

Spatially resolved optical emission spectroscopy (OES) in plasma processing

#4 | 2014-04-17
US20140106477A1
Electricity

Method of endpoint detection of plasma etching process using multivariate analysis

#5 | 2012-08-09
US20120199287A1
Physics

Transforming metrology data from a semiconductor treatment system using multivariate analysis

#6 | 2010-12-28
US10412450
-

Polynucleotides and methods of directing the ratio of B2:B1 avermectins in host cells

#7 | 2009-04-09
US20090094001A1
Physics

Transforming metrology data from a semiconductor treatment system using multivariate analysis

#8 | 2009-01-15
US20090017508A1
Chemistry; metallurgy

gene directing the ratio of B2:B1 avermectins

#9 | 2008-09-04
US20080212080A1
Electricity

Measuring a process parameter of a semiconductor fabrication process using optical metrology

#10 | 2008-06-17
US10361376
-

gene directing the ratio of B2:B1 avermectins

#11 | 2008-05-22
US20080117437A1
Physics

Drift compensation for an optical metrology tool

#12 | 2008-05-22
US20080117411A1
Physics

Matching optical metrology tools using spectra enhancement

#13 | 2008-02-05
US11639515
-

Measuring a process parameter of a semiconductor fabrication process using optical metrology

#14 | 2007-09-13
US20070211260A1
Physics

Weighting function to enhance measured diffraction signals in optical metrology

#15 | 2007-08-09
US20070185684A1
Physics

Transforming metrology data from a semiconductor treatment system using multivariate analysis

InventorID:

728008 ⎘