Austin, Texas
United States
22
2013-10-31
The entities that hold a legal rights for patent applications filed by inventor Scheer Steven:
Steven Scheer from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method and system for controlling a spike anneal process
#2 | 2012-09-27Electrostatic post exposure bake apparatus and method
#3 | 2012-02-23TECHNIQUE TO FORM A SELF-ALIGNED DOUBLE PATTERN
#4 | 2012-02-23METHOD FOR FORMING A SELF-ALIGNED DOUBLE PATTERN
#5 | 2011-11-03Substrate treatment to reduce pattern roughness
#6 | 2011-08-25Line pattern collapse mitigation through gap-fill material application
#7 | 2010-10-28Dual tone development with plural photo-acid generators in lithographic applications
#8 | 2010-10-28Dual tone development with a photo-activated acid enhancement component in lithographic applications
#9 | 2010-10-28Flood exposure process for dual tone development in lithographic applications
#10 | 2010-09-30Using electric-field directed post-exposure bake for double-patterning (D-P)
#11 | 2010-05-13Dual tone development processes
#12 | 2010-03-25Variable resist protecting groups
#13 | 2010-03-18Method for creating gray-scale features for dual tone development processes
#14 | 2010-03-04Method of process optimization for dual tone development
#15 | 2010-03-04METHOD OF PATTERNING A SUBSTRATE USING DUAL TONE DEVELOPMENT
#16 | 2009-09-03Method for patterning a semiconductor wafer
#17 | 2009-06-04Enhanced process yield using a hot-spot library
#18 | 2008-10-02VACUUM ASSIST METHOD AND SYSTEM FOR REDUCING INTERMIXING OF LITHOGRAPHY LAYERS
#19 | 2008-10-02Methods and heat treatment apparatus for uniformly heating a substrate during a bake process
#20 | 2008-04-03Method of real time dynamic CD control
#21 | 2007-10-25Optimized characterization of wafers structures for optical metrology
#22 | 2007-09-27System and method for semiconductor device fabrication using modeling
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