Leica Microsystems Lithography GmbH

City:

Jena

Country:

Germany

Published Applications:

Last publication date:

2006-08-31

Patent Grants:

Last grant date:

2009-02-17

Top Inventors for applications by Leica Microsystems Lithography GmbH

These are the the leading inventors for applications assigned to Leica Microsystems Lithography GmbH:

Peter Hudek 2 Jena, Germany
Dirk Beyer 2 Weimar, Germany
Thomas Peschel 1 Jena, Germany
Christoph DAMM 1 Jena, Germany

Stefan Risse 1 Jena, Germany
Hans-Joachim Doering 1 Jena, Germany
Peter Hahmann 1 Jena-Drackendorf, Germany
Detlef Melzer 1 Jena, Germany

Andreas Gebhardt 1 Apolda, Germany
Michael Gehre 1 Jena, Germany
Heike Gauglitz 1 Jena, Germany
Gerhard Schubert 1 Jena, Germany

Andreas Schubert 1 Niederrossla, Germany
Christoph Schenk 1 Jena, Germany
Lemke Melchior 1 Jena-Cospeda, Germany
Thomas Elster 1 Jena, Germany

Michael Hopp 1 Kahla, Germany
Mathias Rohde 1 Jena, Germany
Joachim Heinitz 1 Isserstedt, Germany

Recent patent applications by Leica Microsystems Lithography GmbH

Leica Microsystems Lithography GmbH based in Jena, DE has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2006-08-31 ✅ Patent 7,491,946 granted on 2009-02-17

US20060192133A1

Physics

Electrostatic deflection system for corpuscular radiation

#2 | 2006-06-08

US20060121396A1

Performing operations; transporting

Method for exposing a substrate with a beam

#3 | 2006-05-18 ✅ Patent 7,332,730 granted on 2008-02-19

US20060102853A1

Electricity

Device and method for imaging a multiple particle beam on a substrate

#4 | 2005-12-29 ✅ Patent 7,435,517 granted on 2008-10-14

US20050287451A1

Performing operations; transporting

Method for reducing the fogging effect

#5 | 2005-12-29 ✅ Patent 7,241,542 granted on 2007-07-10

US20050287450A1

Performing operations; transporting

Process for controlling the proximity effect correction

AssigneeID:

291896 ⎘